Holograms deep inside Silicon

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dc.contributor.authorMakey, Ghaithen_US
dc.contributor.authorTokel, Onuren_US
dc.contributor.authorTurnalı, Ahmeten_US
dc.contributor.authorPavlov, Ihoren_US
dc.contributor.authorElahi, Parvizen_US
dc.contributor.authorYavuz, Ozg ¨ unen_US
dc.contributor.authorİlday, F. Ömeren_US
dc.coverage.spatialHeidelberg Germanyen_US
dc.date.accessioned2018-04-12T11:42:04Z
dc.date.available2018-04-12T11:42:04Z
dc.date.issued2016en_US
dc.departmentDepartment of Physicsen_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.descriptionConference name: 3D Image Acquisition and Display: Technology, Perception and Applications 2016en_US
dc.descriptionDate of Conference: 25–28 July 2016en_US
dc.description.abstractThrough the Nonlinear Laser Lithography method, we demonstrate the first computer generated holograms fabricated deep inside Silicon. Fourier and Fresnel holograms are fabricated buried inside Si wafers, and a generation algorithm is developed for hologram fabrication. © OSA 2016.en_US
dc.identifier.doi10.1364/3D.2016.JW4A.2en_US
dc.identifier.isbn9781943580156
dc.identifier.urihttp://hdl.handle.net/11693/37497
dc.language.isoEnglishen_US
dc.publisherOptical Society of Americaen_US
dc.relation.isversionofhttp://dx.doi.org/10.1364/3D.2016.JW4A.2en_US
dc.source.titleImaging and Applied Optics 2016en_US
dc.subjectFabricationen_US
dc.subjectImage acquisitionen_US
dc.subjectLithographyen_US
dc.subjectSilicon wafersen_US
dc.subjectComputer generated hologramsen_US
dc.subjectFourieren_US
dc.subjectFresnel hologramsen_US
dc.subjectGeneration algorithmen_US
dc.subjectNonlinear lasersen_US
dc.subjectSi waferen_US
dc.subjectHologramsen_US
dc.titleHolograms deep inside Siliconen_US
dc.typeConference Paperen_US

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