XPS for chemical-and charge-sensitive analyses
buir.contributor.author | Süzer, Şefik | |
dc.citation.epage | 11 | en_US |
dc.citation.spage | 1 | en_US |
dc.citation.volumeNumber | 534 | en_US |
dc.contributor.author | Sezen, H. | en_US |
dc.contributor.author | Süzer, Şefik | en_US |
dc.date.accessioned | 2015-07-28T11:56:06Z | |
dc.date.available | 2015-07-28T11:56:06Z | |
dc.date.issued | 2013-05-01 | en_US |
dc.department | Department of Chemistry | en_US |
dc.description.abstract | By recording X-ray photoelectron spectroscopic binding energy shifts, while subjecting samples to a variety of optical and electrical stimuli, information about charge accumulation on materials or surface structures can be obtained. These stimuli included d.c. as well as a.c. electrical and/or optical pulses covering a wide frequency range (10−3 to 106 Hz) for probing charging and/or photovoltage shifts, stemming from impurities, dopants, defects, etc., whether created intentionally or not. The methodology is simple to implement and provides several new dimensions for thin films and materials analyses. | en_US |
dc.identifier.doi | 10.1016/j.tsf.2013.02.002 | en_US |
dc.identifier.eissn | 1879-2731 | |
dc.identifier.issn | 0040-6090 | |
dc.identifier.uri | http://hdl.handle.net/11693/10854 | |
dc.language.iso | English | en_US |
dc.publisher | Elsevier | en_US |
dc.relation.isversionof | http://dx.doi.org/10.1016/j.tsf.2013.02.002 | en_US |
dc.source.title | Thin Solid Films | en_US |
dc.title | XPS for chemical-and charge-sensitive analyses | en_US |
dc.type | Article | en_US |
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