XPS for chemical-and charge-sensitive analyses

buir.contributor.authorSüzer, Şefik
dc.citation.epage11en_US
dc.citation.spage1en_US
dc.citation.volumeNumber534en_US
dc.contributor.authorSezen, H.en_US
dc.contributor.authorSüzer, Şefiken_US
dc.date.accessioned2015-07-28T11:56:06Z
dc.date.available2015-07-28T11:56:06Z
dc.date.issued2013-05-01en_US
dc.departmentDepartment of Chemistryen_US
dc.description.abstractBy recording X-ray photoelectron spectroscopic binding energy shifts, while subjecting samples to a variety of optical and electrical stimuli, information about charge accumulation on materials or surface structures can be obtained. These stimuli included d.c. as well as a.c. electrical and/or optical pulses covering a wide frequency range (10−3 to 106 Hz) for probing charging and/or photovoltage shifts, stemming from impurities, dopants, defects, etc., whether created intentionally or not. The methodology is simple to implement and provides several new dimensions for thin films and materials analyses.en_US
dc.identifier.doi10.1016/j.tsf.2013.02.002en_US
dc.identifier.eissn1879-2731
dc.identifier.issn0040-6090
dc.identifier.urihttp://hdl.handle.net/11693/10854
dc.language.isoEnglishen_US
dc.publisherElsevieren_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/j.tsf.2013.02.002en_US
dc.source.titleThin Solid Filmsen_US
dc.titleXPS for chemical-and charge-sensitive analysesen_US
dc.typeArticleen_US

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