Highly doped silicon micromachined photonic crystals
buir.contributor.author | Özbay, Ekmel | |
buir.contributor.author | Bayındır, Mehmet | |
buir.contributor.orcid | Özbay, Ekmel|0000-0003-2953-1828 | |
dc.citation.epage | 185 | en_US |
dc.citation.spage | 183 | en_US |
dc.contributor.author | Temelkuran, B. | en_US |
dc.contributor.author | Bayındır, Mehmet | en_US |
dc.contributor.author | Özbay, Ekmel | en_US |
dc.contributor.author | Kavanaugh, J. P. | en_US |
dc.contributor.author | Sigalas, M. M. | en_US |
dc.contributor.author | Tuttle, G. | en_US |
dc.date.accessioned | 2016-02-08T10:36:48Z | |
dc.date.available | 2016-02-08T10:36:48Z | |
dc.date.issued | 2000 | en_US |
dc.department | Department of Physics | en_US |
dc.description.abstract | Summary form only given. Photonic crystals are periodic structures with the property of reflecting the electromagnetic (EM) waves in all directions within a certain frequency range. These structures can be used to control and manipulate the behaviour of EM waves. Although earlier work concentrated on building these crystals with dielectric materials, there are certain advantages of introducing metals to photonic crystals. First, metals offer a high rejection rate when compared to the dielectric crystals. Second, for microwave applications, the dimensions of metallic crystals can be kept much smaller than the minimum dimensions needed for a typical dielectric crystal. In the paper, we propose a method for the fabrication of layer-by-layer metallic photonic crystals. A similar method had been used by Ozbay et al. to fabricate dielectric photonic crystals using silicon wafers. We fabricated a new layer-by-layer photonic crystal using highly doped silicon wafers. | en_US |
dc.description.provenance | Made available in DSpace on 2016-02-08T10:36:48Z (GMT). No. of bitstreams: 1 bilkent-research-paper.pdf: 70227 bytes, checksum: 26e812c6f5156f83f0e77b261a471b5a (MD5) Previous issue date: 2000 | en |
dc.identifier.doi | 10.1109/CLEO.2000.906888 | en_US |
dc.identifier.isbn | 1-55752-634-6 | |
dc.identifier.uri | http://hdl.handle.net/11693/24960 | |
dc.language.iso | English | en_US |
dc.publisher | IEEE, Piscataway, NJ, United States | en_US |
dc.relation.isversionof | https://doi.org/10.1109/CLEO.2000.906888 | en_US |
dc.source.title | Pacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digest | en_US |
dc.subject | Coating techniques | en_US |
dc.subject | Electric conductivity | en_US |
dc.subject | Electromagnetic fields | en_US |
dc.subject | Etching | en_US |
dc.subject | Nitrates | en_US |
dc.subject | Photolithography | en_US |
dc.subject | Photons | en_US |
dc.subject | Plasma enhanced chemical vapor deposition | en_US |
dc.subject | Potassium compounds | en_US |
dc.subject | Semiconductor device manufacture | en_US |
dc.subject | Silicon wafers | en_US |
dc.subject | Layer by layer metallic photonic crystal | en_US |
dc.subject | Metallicity gap | en_US |
dc.subject | Potassium hydroxide | en_US |
dc.subject | Semiconductor micromachining | en_US |
dc.subject | Crystals | en_US |
dc.title | Highly doped silicon micromachined photonic crystals | en_US |
dc.type | Article | en_US |
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