Highly doped silicon micromachined photonic crystals

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buir.contributor.authorÖzbay, Ekmel
buir.contributor.authorBayındır, Mehmet
buir.contributor.orcidÖzbay, Ekmel|0000-0003-2953-1828
dc.citation.epage185en_US
dc.citation.spage183en_US
dc.contributor.authorTemelkuran, B.en_US
dc.contributor.authorBayındır, Mehmeten_US
dc.contributor.authorÖzbay, Ekmelen_US
dc.contributor.authorKavanaugh, J. P.en_US
dc.contributor.authorSigalas, M. M.en_US
dc.contributor.authorTuttle, G.en_US
dc.date.accessioned2016-02-08T10:36:48Z
dc.date.available2016-02-08T10:36:48Z
dc.date.issued2000en_US
dc.departmentDepartment of Physicsen_US
dc.description.abstractSummary form only given. Photonic crystals are periodic structures with the property of reflecting the electromagnetic (EM) waves in all directions within a certain frequency range. These structures can be used to control and manipulate the behaviour of EM waves. Although earlier work concentrated on building these crystals with dielectric materials, there are certain advantages of introducing metals to photonic crystals. First, metals offer a high rejection rate when compared to the dielectric crystals. Second, for microwave applications, the dimensions of metallic crystals can be kept much smaller than the minimum dimensions needed for a typical dielectric crystal. In the paper, we propose a method for the fabrication of layer-by-layer metallic photonic crystals. A similar method had been used by Ozbay et al. to fabricate dielectric photonic crystals using silicon wafers. We fabricated a new layer-by-layer photonic crystal using highly doped silicon wafers.en_US
dc.identifier.doi10.1109/CLEO.2000.906888en_US
dc.identifier.isbn1-55752-634-6
dc.identifier.urihttp://hdl.handle.net/11693/24960
dc.language.isoEnglishen_US
dc.publisherIEEE, Piscataway, NJ, United Statesen_US
dc.relation.isversionofhttps://doi.org/10.1109/CLEO.2000.906888en_US
dc.source.titlePacific Rim Conference on Lasers and Electro-Optics, CLEO - Technical Digesten_US
dc.subjectCoating techniquesen_US
dc.subjectElectric conductivityen_US
dc.subjectElectromagnetic fieldsen_US
dc.subjectEtchingen_US
dc.subjectNitratesen_US
dc.subjectPhotolithographyen_US
dc.subjectPhotonsen_US
dc.subjectPlasma enhanced chemical vapor depositionen_US
dc.subjectPotassium compoundsen_US
dc.subjectSemiconductor device manufactureen_US
dc.subjectSilicon wafersen_US
dc.subjectLayer by layer metallic photonic crystalen_US
dc.subjectMetallicity gapen_US
dc.subjectPotassium hydroxideen_US
dc.subjectSemiconductor micromachiningen_US
dc.subjectCrystalsen_US
dc.titleHighly doped silicon micromachined photonic crystalsen_US
dc.typeArticleen_US

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