Electronic structure of Ge-Si superlattices grown on Ge (001)

buir.contributor.authorÇıracı, Salim
buir.contributor.orcidÇıracı, Salim|0000-0001-8023-9860
dc.citation.epage641en_US
dc.citation.issueNumber7en_US
dc.citation.spage638en_US
dc.citation.volumeNumber6en_US
dc.contributor.authorGülseren, Oğuzen_US
dc.contributor.authorÇıracı, Salimen_US
dc.date.accessioned2018-04-12T13:50:54Z
dc.date.available2018-04-12T13:50:54Z
dc.date.issued1991en_US
dc.departmentDepartment of Physicsen_US
dc.description.abstractThe authors have studied the electronic energy structure of pseudomorphic Gem/Sin superlattices by using the empirical tight-binding method. Effects of the band offset, sublattice periodicity and the lateral lattice constant on the transition energies have been investigated. They found that GemSin superlattices grown on Ge (001) can have a direct band gap, if m+n=10 and m=6. However, optical matrix elements for in-plane and perpendicular polarized light are negligible for the transition from the highest valence band to the lowest conduction band state at the centre of the superlattice Brillouin zone.en_US
dc.description.provenanceMade available in DSpace on 2018-04-12T13:50:54Z (GMT). No. of bitstreams: 1 bilkent-research-paper.pdf: 179475 bytes, checksum: ea0bedeb05ac9ccfb983c327e155f0c2 (MD5) Previous issue date: 1991en
dc.identifier.doi10.1088/0268-1242/6/7/014en_US
dc.identifier.issn0268-1242
dc.identifier.urihttp://hdl.handle.net/11693/38215
dc.language.isoEnglishen_US
dc.relation.isversionofhttp://dx.doi.org/10.1088/0268-1242/6/7/014en_US
dc.source.titleSemiconductor Science and Technologyen_US
dc.subjectEmpirical Tight-Bonding Methoden_US
dc.subjectHigh Carrier Mobility Direct-Band Semiconductoren_US
dc.subjectSuperlattice Brillouin Zoneen_US
dc.subjectLight - Brillouin Scatteringen_US
dc.subjectSemiconductor Materials - Charge Carriersen_US
dc.subjectSuperlatticesen_US
dc.titleElectronic structure of Ge-Si superlattices grown on Ge (001)en_US
dc.typeReviewen_US

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