Analysis of Fe nanoparticles using XPS measurements under d.c. or pulsed-voltage bias

buir.contributor.authorSüzer, Şefik
dc.citation.epage862en_US
dc.citation.issueNumber6-7en_US
dc.citation.spage859en_US
dc.citation.volumeNumber42en_US
dc.contributor.authorSüzer, Şefiken_US
dc.contributor.authorBaer, D. R.en_US
dc.contributor.authorEngelhard, M. H.en_US
dc.date.accessioned2016-02-08T12:24:19Z
dc.date.available2016-02-08T12:24:19Z
dc.date.issued2010en_US
dc.departmentDepartment of Chemistryen_US
dc.description.abstractThe impact of solution exposure on the charging properties of oxide coatings on Fe metal-core oxide-shell nanoparticles has been examined by sample biasing during XPS measurements. The Fe nanoparticles were suspended in relatively unreactive acetone and analyzed after particles containing solutions were deposited on SiO2/Si or Au substrates. The particle and substrate combinations were subjected to ±10V d.c. or ±5V a.c., biasing in the form of square wave (SQW) pulses. The samples experienced variable degrees of charging for which low-energy electrons at ∼1eV, 20 μA and low-energy Ar+ ions were used to minimize it. Application of d.c. bias and/or SQW pulses significantly influences the extent of charging, which is utilized to gather additional analytical information about the sample under investigation. This approach allows separation of otherwise overlapping peaks. Accordingly, the O1s peaks of the silicon oxide substrate, the iron oxide nanoparticles, and that of the casting solvent can be separated from each other. Similarly, the C1s peak belonging to the solvent can be separated from that of the adventitious carbon. The charging shifts of the iron nanoparticles are strongly influenced by the solvent to which the particles were exposed. Hence, acetone exhibited the largest shift, water the smallest, and methanol in between. Dynamical measurements performed by application of the voltage stress in the form of SQW pulses provides information about the time constants of the processes involved, which leads us to postulate that these charging properties we probe in these systems stem mainly from ionic movement(s).en_US
dc.identifier.doi10.1002/sia.3260en_US
dc.identifier.eissn1096-9918
dc.identifier.issn0142-2421
dc.identifier.urihttp://hdl.handle.net/11693/28580
dc.language.isoEnglishen_US
dc.relation.isversionofhttp://dx.doi.org/10.1002/sia.3260en_US
dc.source.titleSurface and Interface Analysisen_US
dc.subjectCasting from different solventsen_US
dc.subjectFe nanoparticlesen_US
dc.subjectXPSen_US
dc.subjectAdventitious carbonen_US
dc.subjectCharging propertyen_US
dc.subjectCharging shiftsen_US
dc.subjectDifferent solventsen_US
dc.subjectFe metalen_US
dc.subjectIn-betweenen_US
dc.subjectIonic movementen_US
dc.subjectIron nanoparticlesen_US
dc.subjectIron oxide nanoparticleen_US
dc.subjectLow energy electronsen_US
dc.subjectLow-energy Aren_US
dc.subjectOverlapping peaksen_US
dc.subjectOxide coatingen_US
dc.subjectShell nanoparticlesen_US
dc.subjectSilicon oxide substratesen_US
dc.subjectSquare wavesen_US
dc.subjectTime constantsen_US
dc.subjectVoltage biasen_US
dc.subjectVoltage stressen_US
dc.subjectXPS measurementsen_US
dc.subjectAcetoneen_US
dc.subjectIonization of liquidsen_US
dc.subjectIron oxidesen_US
dc.subjectMethanolen_US
dc.subjectProtective coatingsen_US
dc.subjectSilicon compoundsen_US
dc.subjectSilicon oxidesen_US
dc.subjectSolventsen_US
dc.subjectSubstratesen_US
dc.subjectX ray photoelectron spectroscopyen_US
dc.subjectNanoparticlesen_US
dc.titleAnalysis of Fe nanoparticles using XPS measurements under d.c. or pulsed-voltage biasen_US
dc.typeArticleen_US
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