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Browsing by Author "Tasli, P."

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    ItemOpen Access
    Contributions of impurity band and electron-electron interactions to magnetoconductance in AlGaN
    (Taylor & Francis, 2010-06-30) Tasli, P.; Yildiz, A.; Kasap, M.; Özbay, Ekmel; Lisesivdin, S. B.; Ozcelik, S.
    Low temperature electrical measurements of conductivity, the Hall effect and magnetoconductance were performed on a degenerate AlGaN sample. The sample exhibited negative magnetoconductance at low magnetic fields and low temperatures, with the magnitude being systematically dependent on temperature. The measured magnetoconductance was compared with models proposed previously by Sondheimer and Wilson [Proc. R. Soc. Lond. Ser. A 190 (1947) p. 435] and Lee and Ramakrishan [Rev. Mod. Phys. 57 (1985) p. 287]. Data were analyzed as the sum of the contribution of a two-band and electron-electron interactions to the magnetoconductance, applying these models to describe the observed behavior. Least-squares fits to the data are presented. In the sample, magnetoconductance can be explained reasonably well by assuming these contributions to the measured magnetoconductance. It was found that theoretical and experimental data were in excellent agreement.
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    ItemOpen Access
    Determination of the critical indium composition corresponding to the metal-insulator transition in InxGa1-xN (0.06 ≤ x ≤ 0.135) layers
    (Elsevier, 2009-10-13) Yildiz, A.; Lisesivdin, S. B.; Tasli, P.; Özbay, Ekmel; Kasap, M.
    The low-temperature conductivity of InxGa1-xN alloys (0.06 ≤ x ≤ 0.135) is analyzed as a function of indium composition (x). Although our InxGa1-xN alloys were on the metallic side of the metal-insulator transition, neither the Kubo-Greenwood nor Born approach were able to describe the transport properties of the InxGa1-xN alloys. In addition, all of the InxGa1-xN alloys took place below the Ioeffe-Regel regime with their low conductivities. The observed behavior is discussed in the framework of the scaling theory. With decreasing indium composition, a decrease in thermal activation energy is observed. For the metal-insulator transition, the critical indium composition is obtained as xc = 0.0543 for InxGa1-xN alloys.
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    ItemOpen Access
    Double subband occupation of the two-dimensional electron gas in InxAl1-XN/AlN/GaN/AlN heterostructures with a low indium content (0.064 ≤ x ≤ 0.140) barrier
    (Elsevier, 2010-05-08) Lisesivdin, S. B.; Tasli, P.; Kasap, M.; Ozturk, M.; Arslan, E.; Ozcelik, S.; Özbay, Ekmel
    We present a carrier transport study on low indium content (0.064 ≤ x ≤ 0.140) InxAl1 - xN/AlN/GaN/AlN heterostructures. Experimental Hall data were carried out as a function of temperature (33-300 K) and a magnetic field (0-1.4 T). A two-dimensional electron gas (2DEG) with single or double subbands and a two-dimensional hole gas were extracted after implementing quantitative mobility spectrum analysis on the magnetic field dependent Hall data. The mobility of the lowest subband of 2DEG was found to be lower than the mobility of the second subband. This behavior is explained by way of interface related scattering mechanisms, and the results are supported with a one-dimensional self-consistent solution of non-linear Schrödinger- Poisson equations.
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    ItemOpen Access
    Grain boundary related electrical transport in Al-rich AlxGa1-xN layers grown by metal-organic chemical vapor deposition
    (M A I K Nauka - Interperiodica, 2011) Yildiz, A.; Tasli, P.; Sarikavak, B.; Lisesivdin, S. B.; Ozturk, M. K.; Kasap, M.; Ozcelik, S.; Özbay, Ekmel
    Electrical transport data for Al-rich AlGaN layers grown by metal-organic chemical vapor deposition (MOCVD) are presented and analyzed in the temperature range 135-300 K. The temperature dependence of electrical conductivity indicated that conductivity in the films was controlled by potential barriers caused by carrier depletion at grain boundaries in the material. The Seto's grain boundary model provided a complete framework for understanding of the conductivity behavior. Various electrical parameters of the present samples such as grain boundary potential, donor concentration, surface trap density, and Debye screening length were extracted.
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    ItemOpen Access
    Investigation of AlInN HEMT structures with different AlGaN buffer layers grown on sapphire substrates by MOCVD
    (ELSEVIER, 2012-06-01) Kelekci, O.; Tasli, P.; Cetin, S. S.; Kasap, M.; Ozcelik, S.; Özbay, Ekmel
    We investigate the structural and electrical properties of Al xIn 1-xN/AlN/GaN heterostructures with AlGaN buffers grown by MOCVD, which can be used as an alternative to AlInN HEMT structures with GaN buffer. The effects of the GaN channel thickness and the addition of a content graded AlGaN layer to the structural and electrical characteristics were studied through variable temperature Hall effect measurements, high resolution XRD, and AFM measurements. Enhancement in electron mobility was observed in two of the suggested Al xIn 1 -xN/AlN/GaN/Al 0.04Ga 0.96N heterostructures when compared to the standard Al xIn 1 -xN/AlN/GaN heterostructure. This improvement was attributed to better electron confinement in the channel due to electric field arising from piezoelectric polarization charge at the Al 0.04Ga 0.96N/GaN heterointerface and by the conduction band discontinuity formed at the same interface. If the growth conditions and design parameters of the Al xIn 1-xN HEMT structures with AlGaN buffers can be modified further, the electron spillover from the GaN channel can be significantly limited and even higher electron mobilities, which result in lower two-dimensional sheet resistances, would be possible.
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    ItemOpen Access
    Well parameters of two-dimensional electron gas in Al0.88In 0.12N/AlN/GaN/AlN heterostructures grown by MOCVD
    (Wiley, 2009-12-01) Tasli, P.; Lisesivdin, S. B.; Yildiz, A.; Kasap, M.; Arslan, E.; Özcelik, S.; Özbay, Ekmel
    Resistivity and Hall effect measurements were carried out as a function of magnetic field (0-1.5 T) and temperature (30-300 K) for Al0.88In 0.12N/AlN/GaN/AlN heterostructures grown by Metal Organic Chemical Vapor Deposition (MOCVD). Magnetic field dependent Hall data were analyzed by using the quantitative mobility spectrum analysis (QMSA). A two-dimensional electron gas (2DEG) channel located at the Al0.88In 0.12N/GaN interface with an AlN interlayer and a two-dimensional hole gas (2DHG) channel located at the GaN/AlN interface were determined for Al 0.88In0.12N/AlN/GaN/AlN heterostructures. The interface parameters, such as quantum well width, the deformation potential constant and correlation length as well as the dominant scattering mechanisms for the Al 0.88In0.12N/GaN interface with an AlN interlayer were determined from scattering analyses based on the exact 2DEG carrier density and mobility obtained with QMSA

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