Browsing by Author "Ozturk, M. K."
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Item Open Access Buffer optimization for crack-free GaN epitaxial layers grown on Si(111) substrate by MOCVD(Institute of Physics Publishing Ltd., 2008) Arslan, E.; Ozturk, M. K.; Teke, A.; Ozcelik, S.; Özbay, EkmelWe report the growth of GaN films on the Si(1 1 1) substrate by metalorganic chemical vapour phase deposition (MOCVD). Different buffer layers were used to investigate their effects on the structural and optical properties of GaN layers. A series of GaN layers were grown on Si(1 1 1) with different buffer layers and buffer thicknesses and were characterized by Nomarski microscopy, atomic force microscopy, high-resolution x-ray diffraction (XRD) and photoluminescence (PL) measurements. We first discuss the optimization of the LT-AlN/HT-AlN/Si(1 1 1) templates and then the optimization of the graded AlGaN intermediate layers. In order to prevent stress relaxation, step-graded AlGaN layers were introduced along with a crack-free GaN layer of thickness exceeding 2.6 νm. The XRD and PL measurements results confirmed that a wurtzite GaN was successfully grown. The resulting GaN film surfaces were flat, mirror-like and crack-free. The mosaic structure in the GaN layers was investigated. With a combination of Williamson-Hall measurements and the fitting of twist angles, it was found that the buffer thickness determines the lateral coherence length, vertical coherence length, as well as the tilt and twist of the mosaic blocks in GaN films. The PL spectra at 8 K show that a strong band edge photoluminescence of GaN on Si (1 1 1) emits light at an energy of 3.449 eV with a full width at half maximum (FWHM) of approximately 16 meV. At room temperature, the peak position and FWHM of this emission become 3.390 eV and 58 meV, respectively. The origin of this peak was attributed to the neutral donor bound exciton. It was found that the optimized total thickness of the AlN and graded AlGaN layers played a very important role in the improvement of quality and in turn reduced the cracks during the growth of GaN/Si(1 1 1) epitaxial layers.Item Open Access The effect of Si(x)N(y) interlayer on the quality of GaN epitaxial layers grown on Si(111) substrates by MOCVD(ELSEVIER, 2008-04-27) Arslan, E.; Ozturk, M. K.; Ozcelik, S.; Özbay, EkmelIn the present paper, the effects of nitridation on the quality of GaN epitaxial films grown on Si(111) substrates by metal-organic chemical vapor phase deposition (MOCVD) are discussed. A series of GaN layers were grown on Si(111) under various conditions and characterized by Nomarski microscopy (NM), atomic force microscopy (AFM), high resolution X-ray diffraction (HRXRD), and room temperature (RT) photoluminescence (PL) measurements. Firstly, we optimized LT-AlN/HT-AlN/Si(111) templates and graded AlGaN intermediate layers thicknesses. In order to prevent stress relaxation, step-graded AlGaN layers were introduced along with a crack-free GaN layer of thickness exceeding 2.2 mu m. Secondly, the effect of in situ substrate nitridation and the insertion of an Si(x)N(y) intermediate layer on the GaN crystalline quality was investigated. Our measurements show that the nitridation position greatly influences the surface morphology and PL and XRD spectra of GaN grown atop the Si(x)N(y) layer. The X-ray diffraction and PL measurements results confirmed that the single-crystalline wurtzite GaN was successfully grown in samples A (without Si(x)N(y) layer) and B (with Si(x)N(y) layer on Si(111)). The resulting GaN film surfaces were flat, mirror-like, and crack-free. The full-width-at-half maximum (FWHM) of the X-ray rocking curve for (0002) diffraction from the GaN epilayer of the sample B in omega-scan was 492 arcsec. The PL spectrum at room temperature showed that the GaN epilayer had a light emission at a wavelength of 365 nm with a FWHM of 6.6 nm (33.2 meV). In sample B, the insertion of a Si(x)N(y) intermediate layer significantly improved the optical and structural properties. In sample C (with Si(x)N(y) layer on Al(0.11)Ga(0.89)N interlayer). The in situ depositing of the, however, we did not obtain any improvements in the optical or structural properties.Item Open Access Evolution of the mosaic structure in InGaN layer grown on a thick GaN template and sapphire substrate(Springer, 2013-08-08) Arslan, E.; Ozturk, M. K.; Cakmak, H.; Demirel, P.; Ozcelik, S.; Özbay, EkmelThe InxGa1-xN epitaxial layers, with indium (x) concentration changes between 0.16 and 1.00 (InN), were grown on GaN template/(0001) Al2O3 substrate by metal organic chemical vapour deposition. The indium content (x), lattice parameters and strain values in the InGaN layers were calculated from the reciprocal lattice mapping around symmetric (0002) and asymmetric (10-15) reflection of the GaN and InGaN layers. The characteristics of mosaic structures, such as lateral and vertical coherence lengths, tilt and twist angle and heterogeneous strain and dislocation densities (edge and screw dislocations) of the InGaN epilayers and GaN template layers were investigated by using high-resolution X-ray diffraction (HR-XRD) measurements. With a combination of Williamson-Hall (W-H) measurements and the fitting of twist angles, it was found that the indium content in the InGaN epilayers did not strongly effect the mosaic structures' parameters, lateral and vertical coherence lengths, tilt and twist angle, or heterogeneous strain of the InGaN epilayers.Item Open Access Grain boundary related electrical transport in Al-rich AlxGa1-xN layers grown by metal-organic chemical vapor deposition(M A I K Nauka - Interperiodica, 2011) Yildiz, A.; Tasli, P.; Sarikavak, B.; Lisesivdin, S. B.; Ozturk, M. K.; Kasap, M.; Ozcelik, S.; Özbay, EkmelElectrical transport data for Al-rich AlGaN layers grown by metal-organic chemical vapor deposition (MOCVD) are presented and analyzed in the temperature range 135-300 K. The temperature dependence of electrical conductivity indicated that conductivity in the films was controlled by potential barriers caused by carrier depletion at grain boundaries in the material. The Seto's grain boundary model provided a complete framework for understanding of the conductivity behavior. Various electrical parameters of the present samples such as grain boundary potential, donor concentration, surface trap density, and Debye screening length were extracted.Item Open Access Improvement of breakdown characteristics in AlGaN/GaN/AlxGa 1-xN HEMT based on a grading Al xGa 1-xN buffer layer(Wiley, 2010-08-03) Yu, H.; Lisesivdin, S. B.; Ozturk, M.; Bolukbas, B.; Kelekci, O.; Ozturk, M. K.; Ozcelik, S.; Caliskan, D.; Cakmak, H.; Demirel, P.; Özbay, EkmelTo improve the breakdown characteristics of an AlGaN/GaN based high electron mobility transistor (HEMT) for high voltage applications, AlGaN/GaN/Al xGa 1-xN double heterostructure (DH-HEMTs) were designed and fabricated by replacing the semi-insulating GaN buffer with content graded Al xGa 1-xN (x=x 1 → x 2, x 1 > x 2), in turn linearly lowering the Al content x from x 1=90% to x 2=5% toward the front side GaN channel on a high temperature AlN buffer layer. The use of a highly resistive Al xGa 1-xN epilayer suppresses the parasitic conduction in the GaN buffer, and the band edge discontinuity limits the channel electrons spillover, thereby reducing leakage current and drain current collapse. In comparison with the conventional HEMT that use a semi-insulating GaN buffer, the fabricated DH-HEMT device with the same size presents a remarkable enhancement of the breakdown voltage.Item Open Access The influence of nitridation time on the structural properties of GaN grown on Si (111) substrate(Springer, 2009) Arslan, E.; Ozturk, M. K.; Duygulu, Ö.; Kaya, A. A.; Ozcelik, S.; Özbay, EkmelIn the present paper, the effect of in-situ substrate nitridation time on crystalline quality of GaN films grown on Si (111) substrates by metal organic chemical vapor deposition (MOCVD) were investigated. A thin buffer layer of silicon nitride (SiN x ) with various thicknesses was achieved through the nitridation of substrate at different nitiridation times ranging from 0 to 660 s. The structural characteristics, such as dislocation densities, correlation lengths of columnar crystallites, the tilt and twist of the mosaic structure, and the angles of rotational disorder, were all studied in detail by using a planar and cross-sectional view of high resolution transmission electron microscopy (HRTEM) and X-ray diffraction (HRXRD) performed at different scattering geometries. It was found that the dislocation densities, lateral coherence lengths, vertical coherence lengths, and the tilt and twist of mosaic blocks in GaN films monotonically varies with the nitridation time. The experimental findings showed that the nitridation times had more influence on edge dislocation densities than the screw type. © 2008 Springer-Verlag.Item Open Access The influence of thickness and ammonia flow rate on the properties of AIN layers(Elsevier, 2012) Corekci, S.; Ozturk, M. K.; Cakmak, M.; Ozcelik, S.; Özbay, EkmelUndoped AlN layers have been grown on c-plane sapphire substrates by metal-organic chemical vapor deposition in order to study the effects of ammonia (NH3) flow rate and layer thickness on the structural quality and surface morphology of AlN layers by high-resolution X-ray diffraction, scanning electron microscopy, and atomic force microscopy. Lower NH3 flow rate improves crystallinity of the symmetric (0 0 0 2) plane in AlN layers. Ammonia flow rate is also correlated with surface quality; pit-free and smooth AlN surfaces have been obtained at a flow rate of 70 standard cm(3) per minute. Thicker AlN films improve the crystallinity of the asymmetric (1 0 1 (1) over bar 2) plane.Item Open Access Strain analysis of InGaN/GaN multi quantum well LED structures(John Wiley and Sons, 2012-06-22) Cetin, S. S.; Ozturk, M. K.; Ozcelik, S.; Özbay, EkmelFive period InGaN/GaN multi quantum well (MQW) light emitting diode (LED) structures were grown by a metalorganic chemical vapor deposition (MOCVD) system on c-plane sapphire. The structural characteristics as a strain-stress analysis of hexagonal epilayers MQWs were determined by using nondestructive high resolution x-ray diffraction (HRXRD) in detail. The strain/stress analysis in AlN, GaN, and InGaN thin films with a variation of the In molar fraction in the InGaN well layers was conducted based on the precise measurement of the lattice parameters. The a- and c-lattice parameters of the structures were calculated from the peak positions obtained by rocking the theta axis at the vicinity of the symmetric and asymmetric plane reflection angles, followed by the in-plane and out-of-plane strains. The biaxial and hydrostatic components of the strain were extracted from the obtained a- and c-direction strains values.Item Open Access Strain analysis of the GaN epitaxial layers grown on nitridated Si(111) substrate by metal organic chemical vapor deposition(Elsevier, 2013-02) Ozturk, M. K.; Arslan, E.; Kars, I.; Ozcelik, S.; Özbay, EkmelThe strain analysis of GaN film on nitridated Si(111) substrate with different growth times between 0 and 660 s via metal organic chemical vapor deposition (MOCVD) was conducted based on the precise measurement of the lattice parameters by using high-resolution X-ray diffraction (HR-XRD). The nitridation time (NT) was changed at a fixed growth condition. The a- and c-lattice parameters were measured, followed by the in-plane and out-of-plane strains. Then, the biaxial and hydrostatic components were extracted from the total strain values obtained, and were then discussed in the present study as functions of the NT. The biaxial strain and stress are also strongly affected by the non-uniformity of the SiNx buffer layer thickness. Published by Elsevier Ltd.