Browsing by Author "Cetin, S. S."

Filter results by typing the first few letters
Now showing 1 - 2 of 2
  • Thumbnail Image
    ItemOpen Access
    Investigation of AlInN HEMT structures with different AlGaN buffer layers grown on sapphire substrates by MOCVD
    (ELSEVIER, 2012-06-01) Kelekci, O.; Tasli, P.; Cetin, S. S.; Kasap, M.; Ozcelik, S.; Özbay, Ekmel
    We investigate the structural and electrical properties of Al xIn 1-xN/AlN/GaN heterostructures with AlGaN buffers grown by MOCVD, which can be used as an alternative to AlInN HEMT structures with GaN buffer. The effects of the GaN channel thickness and the addition of a content graded AlGaN layer to the structural and electrical characteristics were studied through variable temperature Hall effect measurements, high resolution XRD, and AFM measurements. Enhancement in electron mobility was observed in two of the suggested Al xIn 1 -xN/AlN/GaN/Al 0.04Ga 0.96N heterostructures when compared to the standard Al xIn 1 -xN/AlN/GaN heterostructure. This improvement was attributed to better electron confinement in the channel due to electric field arising from piezoelectric polarization charge at the Al 0.04Ga 0.96N/GaN heterointerface and by the conduction band discontinuity formed at the same interface. If the growth conditions and design parameters of the Al xIn 1-xN HEMT structures with AlGaN buffers can be modified further, the electron spillover from the GaN channel can be significantly limited and even higher electron mobilities, which result in lower two-dimensional sheet resistances, would be possible.
  • Thumbnail Image
    ItemOpen Access
    Strain analysis of InGaN/GaN multi quantum well LED structures
    (John Wiley and Sons, 2012-06-22) Cetin, S. S.; Ozturk, M. K.; Ozcelik, S.; Özbay, Ekmel
    Five period InGaN/GaN multi quantum well (MQW) light emitting diode (LED) structures were grown by a metalorganic chemical vapor deposition (MOCVD) system on c-plane sapphire. The structural characteristics as a strain-stress analysis of hexagonal epilayers MQWs were determined by using nondestructive high resolution x-ray diffraction (HRXRD) in detail. The strain/stress analysis in AlN, GaN, and InGaN thin films with a variation of the In molar fraction in the InGaN well layers was conducted based on the precise measurement of the lattice parameters. The a- and c-lattice parameters of the structures were calculated from the peak positions obtained by rocking the theta axis at the vicinity of the symmetric and asymmetric plane reflection angles, followed by the in-plane and out-of-plane strains. The biaxial and hydrostatic components of the strain were extracted from the obtained a- and c-direction strains values.