Browsing by Author "Çakmak, M."
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Item Open Access The behavior of the I-V-T characteristics of inhomogeneous (Ni∕Au)-Al0.3Ga0.7N∕AlN∕GaN heterostructures at high temperatures(EDP Sciences, 2007-09-12) Tekeli, Z.; Altındal, S.; Çakmak, M.; Özçelik, S.; Çalıikan, D.; Özbay, EkmelWe investigated the behavior of the forward bias current-voltage-temperature (I-V-T) characteristics of inhomogeneous (Ni/Au)-Al0.3Ga0.7N/AlN/GaN heterostructures in the temperature range of 295-415 K. The experimental results show that all forward bias semilogarithmic I-V curves for the different temperatures have a nearly common cross point at a certain bias voltage, even with finite series resistance. At this cross point, the sample current is temperature independent. We also found that the values of series resistance (R-s) that were obtained from Cheung's method are strongly dependent on temperature and the values abnormally increased with increasing temperature. Moreover, the ideality factor (n), zero-bias barrier height (Phi(B0)) obtained from I-V curves, and R-s were found to be strongly temperature dependent and while Phi(B0) increases, n decreases with increasing temperature. Such behavior of Phi(B0) and n is attributed to Schottky barrier inhomogeneities by assuming a Gaussian distribution (GD) of the barrier heights (BHs) at the metal/semiconductor interface. We attempted to draw a Phi(B0) versus q/2kT plot in order to obtain evidence of the GD of BHs, and the values of (Phi) over bar (B0)=1.63 eV and sigma(0)=0.217 V for the mean barrier height and standard deviation at a zero bias, respectively, were obtained from this plot. Therefore, a modified ln(I-0/T-2)-q(2)sigma(2)(0)/2(kT)(2) versus q/kT plot gives Phi(B0) and Richardson constant A(*) as 1.64 eV and 34.25 A/cm(2) K-2, respectively, without using the temperature coefficient of the barrier height. The Richardson constant value of 34.25 A/cm(2) K-2 is very close to the theoretical value of 33.74 A/cm(2) K-2 for undoped Al0,3Ga0,7N. Therefore, it has been concluded that the temperature dependence of the forward I-V characteristics of the (Ni/Au)-Al0.3Ga0.7/AlN/GaN heterostructures can be successfully explained based on the thermionic emission mechanism with the GD of BHs.Item Open Access Characterization of AlInN/AlN/GaN heterostructures with different AlN buffer thickness(Springer New York LLC, 2016) Çörekçi, S.; Dugan, S.; Öztürk, M. K.; Çetin, S. Ş.; Çakmak, M.; Özçelik, S.; Özbay, EkmelTwo AlInN/AlN/GaN heterostructures with 280-nm- and 400-nm-thick AlN buffer grown on sapphire substrates by metal-organic chemical vapor deposition (MOCVD) have been investigated by x-ray diffraction (XRD), atomic force microscopy (AFM), photoluminescence (PL) and Hall-effect measurements. The symmetric (0002) plane with respect to the asymmetric (101 ¯ 2) plane in the 280-nm-thick AlN buffer has a higher crystal quality, as opposed to the 400-nm-thick buffer. The thinner buffer improves the crystallinity of both (0002) and (101 ¯ 2) planes in the GaN layers, it also provides a sizeable reduction in dislocation density of GaN. Furthermore, the lower buffer thickness leads to a good quality surface with an rms roughness of 0.30 nm and a dark spot density of 4.0 × 108 cm−2. The optical and transport properties of the AlInN/AlN/GaN structure with the relatively thin buffer are compatible with the enhancement in its structural quality, as verified by XRD and AFM results.Item Open Access Characterization of an AlN buffer layer and a thick-GaN layer grown on sapphire substrate by MOCVD(Springer, 2010-10-23) Çörekçi, S.; Öztürk, M. K.; Bengi, A.; Çakmak, M.; Özçelik, S.; Özbay, EkmelAn AlN buffer layer and a thick-GaN layer for high-electron-mobility transistors (HEMTs) were grown on sapphire substrate by metal-organic chemical vapor deposition (MOCVD). The structural and morphological properties of the layers were investigated by high resolution X-ray diffraction (HRXRD) and atomic force microscopy (AFM) techniques. The optical quality of the thick-GaN layer was also evaluated in detail by a photoluminescence (PL) measurement. It was found that the AlN buffer layer possesses high crystal quality and an atomically flat surface with a root-mean-square (rms) roughness of 0.16 nm. The screw-and edge-type dislocation densities of the thick-GaN layer were determined as 5.4 9 107 and 5.0 9 109 cm-2 by means of the mosaic crystal model, respectively. It was observed that the GaN layer has a smooth surface with an rms of 0.84 nm. Furthermore, the dark spot density of the GaN surface was estimated as 6.5 9 108 cm-2 over a scan area of 4 μm2. © Springer Science+Business Media, LLC 2010.Item Open Access Effect of Molecular and Electronic Structure on the Light-Harvesting Properties of Dye Sensitizers(American Chemical Society, 2007-05-24) Mete, E.; Uner, D.; Çakmak, M.; Gulseren, O.; Ellialtoğlu, Ş.The systematic trends in structural and electronic properties of perylenediimide (PDI)-derived dye molecules have been investigated by DFT calculations based on the projector-augmented wave (PAW) method including gradient-corrected exchange−correlation effects. Time-dependent density functional theory (TDDFT) calculations have been performed to study the visible absorbance activity of these complexes. The effect of different ligands and halogen atoms attached to PDI were studied to characterize the light-harvesting properties. The atomic size and electronegativity of the halogen were observed to alter the relaxed molecular geometries, which in turn influenced the electronic behavior of the dye molecules. The ground-state molecular structure of isolated dye molecules studied in this work depends on both the halogen atom and the carboxylic acid groups. DFT calculations revealed that the carboxylic acid ligands did not play an important role in changing the HOMO−LUMO gap of the sensitizer. However, they serve as an anchor between the PDI and substrate TiO2 surface of the solar cell or photocatalyst. A commercially available dye sensitizer, ruthenium bipyridine [Ru(bpy)3]2+ (RuBpy), was also studied for electronic and structural properties in order to make a comparison with PDI derivatives for light-harvesting properties. Results of this work suggest that fluorinated, chlorinated, brominated, and iodinated PDI compounds can be useful as sensitizers in solar cells and in artificial photosynthesis.Item Open Access Effects of high-temperature AIN buffer on the microstructure of AlGaN/GaN HEMTs(Pleiades Publishing, 2013) Çörekçi, S.; Öztürk, M. K.; Yu, H.; Çakmak, M.; Özçelik, S.; Özbay, EkmelEffects on AlGaN/GaN high-electron-mobility transistor structure of a high-temperature AlN buffer on sapphire substrate have been studied by high-resolution x-ray diffraction and atomic force microscopy techniques. The buffer improves the microstructural quality of GaN epilayer and reduces approximately one order of magnitude the edge-type threading dislocation density. As expected, the buffer also leads an atomically flat surface with a low root-mean-square of 0.25 nm and a step termination density in the range of 108 cm-2. Due to the high-temperature buffer layer, no change on the strain character of the GaN and AlGaN epitaxial layers has been observed. Both epilayers exhibit compressive strain in parallel to the growth direction and tensile strain in perpendicular to the growth direction. However, an high-temperature AlN buffer layer on sapphire substrate in the HEMT structure reduces the tensile stress in the AlGaN layer.Item Open Access The profile of temperature and voltage dependent series resistance and the interface states in (Ni/Au)/Al0.3Ga0.7N/AlN/GaN heterostructures(Elsevier BV, 2008-11) Tekeli, Z.; Altındal, Ş.; Çakmak, M.; Özçelik, S.; Özbay, EkmelThe temperature dependence of capacitance–voltage (C–V) and the conductance–voltage (G/w–V) characteristics of (Ni/Au)/Al0.3Ga0.7N/AlN/GaN heterostructures were investigated by considering the effect of series resistance (Rs) and interface states Nss in a wide temperature range (79–395 K). Our experimental results show that both Rs and Nss were found to be strongly functional with temperature and bias voltage. Therefore, they affect the (C–V) and (G/w–V) characteristics. The values of capacitance give two peaks at high temperatures, and a crossing at a certain bias voltage point (∼3.5 V). The first capacitance peaks are located in the forward bias region (∼0.1 V) at a low temperature. However, from 295 K the second capacitance peaks appear and then shift towards the reverse bias region that is located at ∼−4.5 V with increasing temperature. Such behavior, as demonstrated by these anomalous peaks, can be attributed to the thermal restructuring and reordering of the interface states. The capacitance (Cm) and conductance (G/w–V) values that were measured under both reverse and forward bias were corrected for the effect of series resistance in order to obtain the real diode capacitance and conductance. The density of Nss, depending on the temperature, was determined from the (C–V) and (G/w–V) data using the Hill–Coleman Method.Item Open Access Structural and optical properties of an InxGa1-xN/GaN nanostructure(Elsevier BV * North-Holland, 2007) Korçak, S.; Öztürk, M. K.; Çörekçi, S.; Akaoğlu, B.; Yu, H.; Çakmak, M.; Sağlam, S.; Özçelik, S.; Özbay, EkmelThe structural and optical properties of an InxGa1-xN/GaN multi-quantum well (MQW) were investigated by using X-ray diffraction (XRD), atomic force microscopy (AFM), spectroscopic ellipsometry (SE) and photoluminescence (PL). The MQW structure was grown on c-plane (0 0 0 1)-faced sapphire substrates in a low pressure metalorganic chemical vapor deposition (MOCVD) reactor. The room temperature photoluminescence spectrum exhibited a blue emission at 2.84 eV and a much weaker and broader yellow emission band with a maximum at about 2.30 eV. In addition, the optical gaps and the In concentration of the structure were estimated by direct interpretation of the pseudo-dielectric function spectrum. It was found that the crystal quality of the InGaN epilayer is strongly related with the Si doped GaN layer grown at a high temperature of 1090 °C. The experimental results show that the growth MQW on the high-temperature (HT) GaN buffer layer on the GaN nucleation layer (NL) can be designated as a method that provides a high performance InGaN blue light-emitting diode (LED) structure.Item Open Access Structural, morphological, and optical properties of AlGaN/GaN heterostructures with AlN buffer and interlayer(AIP Publishing LLC, 2007) Çörekçi, S.; Öztürk, M. K.; Akaoğlu, B.; Çakmak, M.; Özçelik, S.; Özbay, EkmelAlxGa1-xN/GaN (x similar to 0.3) heterostructures with and without a high-temperature (HT) AlN interlayer (IL) have been grown on sapphire (Al2O3) substrates and AlN buffer/Al2O3 templates by metal organic chemical vapor deposition. The effects of an AlN buffer layer (BL) grown on an Al2O3 substrate and an AlN IL grown under the AlGaN ternary layer (TL) on structural, morphological, and optical properties of the heterostructures have been investigated by high-resolution x-ray diffraction, spectroscopic ellipsometry, atomic force microscopy, and photoluminescence measurements. The AlN BL improves the crystal quality of the AlGaN TL. Further improvement is achieved by inserting an AlN IL between GaN BL and AlGaN TL. However, experimental results also show that a HT AlN IL leads to relatively rough surfaces on AlGaN TLs, and an AlN IL changes the strain in the AlGaN TL from tensile to compressive type. In addition, an AlN BL improves the top surface quality of heterostructures.