Influence of substrate temperature and bias voltage on the optical transmittance of TIN Films

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buir.contributor.authorAydınlı, Atilla
dc.citation.epage28en_US
dc.citation.issueNumber1en_US
dc.citation.spage21en_US
dc.citation.volumeNumber70en_US
dc.contributor.authorDurusoy, H. Z.en_US
dc.contributor.authorDuyar, O.en_US
dc.contributor.authorAydınlı, Atillaen_US
dc.contributor.authorAy, F.en_US
dc.date.accessioned2015-07-28T11:57:06Z
dc.date.available2015-07-28T11:57:06Z
dc.date.issued2003en_US
dc.departmentDepartment of Physicsen_US
dc.description.abstractTitanium nitride (TiN) thin films were prepared by means of reactive DC sputtering on quartz and sapphire substrates. Structural, electrical and optical effects of deposition parameters such as thickness, substrate temperature, substrate bias voltage were studied. The effect of substrate temperature variations in the 100-300degreesC range and substrate bias voltage variations in the 0-200 V DC range for 45-180 nm thick TiN films were investigated. Temperature-ependent electrical resistivity in the 100-350K range and optical transmission in the 300-1500 nm range were measured for the samples. In addition, structural and morphological properties were studied by means of XRD and STM techniques. The smoothest surface and the lowest electrical resistivity was recorded for the optimal samples that were biased at about V-s= -120V DC. Unbiased films exhibited a narrow optical transmission window between 300 and 600 nm. However, the transmission became much greater with increasing bias voltage for the same substrate temperature. Furthermore, it was found that lower substrate temperatures produced optically more transparent films. Application of single layers of MgF2 antireflecting coating on optimally prepared TiN films helped increase the optical transmission in the visible region to more than 40% for 45 nm thick samples.en_US
dc.identifier.doi10.1016/S0042-207X(02)00663-2en_US
dc.identifier.issn0042-207X
dc.identifier.urihttp://hdl.handle.net/11693/11215
dc.language.isoEnglishen_US
dc.publisherElsevier Scienceen_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/S0042-207X(02)00663-2en_US
dc.source.titleVacuumen_US
dc.subjectTitanium nitrideen_US
dc.subjectOptical transmittanceen_US
dc.subjectElectrical resistanceen_US
dc.subjectAr coatingen_US
dc.titleInfluence of substrate temperature and bias voltage on the optical transmittance of TIN Filmsen_US
dc.typeArticleen_US
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