Enhanced peak separation in XPS with external biasing

Simple item page
buir.contributor.authorSüzer, Şefik
dc.citation.epage15en_US
dc.citation.issueNumber1-4en_US
dc.citation.spage12en_US
dc.citation.volumeNumber249en_US
dc.contributor.authorErtas, G.en_US
dc.contributor.authorDemirok, U. K.en_US
dc.contributor.authorSüzer, Şefiken_US
dc.date.accessioned2015-07-28T11:57:30Z
dc.date.available2015-07-28T11:57:30Z
dc.date.issued2005-08-15en_US
dc.departmentDepartment of Chemistryen_US
dc.description.abstractWe have demonstrated that the An 4f peaks of the capped gold nanoparticles deposited on a SiO2 (20 nm)/Si substrate can be separated form the An 4f peaks of a gold metal strip, in contact with the same sample, by application of an external voltage bias to the sample rod while recording the XPS spectra. The external bias controls the flow of low-energy electrons falling on to the sample which in-turn controls the extent of the differential charging of the oxide layer leading to shifts in the binding energy of the gold nanoparticles in contact with the layer. The method is simple and effective for enhancing peak separation and identification of hetero-structures. (c) 2004 Elsevier B.V. All rights reserved.en_US
dc.identifier.doi10.1016/j.apsusc.2004.11.086en_US
dc.identifier.issn0169-4332
dc.identifier.urihttp://hdl.handle.net/11693/11368
dc.language.isoEnglishen_US
dc.publisherElsevieren_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/j.apsusc.2004.11.086en_US
dc.source.titleApplied Surface Scienceen_US
dc.subjectExternal biasingen_US
dc.subjectDifferential chargingen_US
dc.subjectPeak separationen_US
dc.subjectGold nanoclustersen_US
dc.titleEnhanced peak separation in XPS with external biasingen_US
dc.typeArticleen_US
Files
Original bundle
Now showing 1 - 1 of 1
Thumbnail Image
Name:
10.1016-j.apsusc.2004.11.086.pdf
Size:
158.96 KB
Format:
Adobe Portable Document Format
Download
Collections
Department of Chemistry