Tuning the metal filling fraction in metal-insulator-metal ultra-broadband perfect absorbers to maximize the absorption bandwidth

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buir.contributor.authorGhobadi, Amir
buir.contributor.authorHajian, Hodjat
buir.contributor.authorRashed, Alireza Rahimi
buir.contributor.authorBütün, Bayram
buir.contributor.authorÖzbay, Ekmel
buir.contributor.orcidÖzbay, Ekmel|0000-0003-2953-1828
dc.citation.epage176en_US
dc.citation.issueNumber3en_US
dc.citation.spage168en_US
dc.citation.volumeNumber6en_US
dc.contributor.authorGhobadi, Amiren_US
dc.contributor.authorHajian, Hodjaten_US
dc.contributor.authorRashed, Alireza Rahimien_US
dc.contributor.authorBütün, Bayramen_US
dc.contributor.authorÖzbay, Ekmelen_US
dc.date.accessioned2019-02-21T16:08:00Z
dc.date.available2019-02-21T16:08:00Z
dc.date.issued2018en_US
dc.departmentNanotechnology Research Center (NANOTAM)en_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.departmentDepartment of Physicsen_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.description.abstractIn this paper, we propose a methodology to maximize the absorption bandwidth of a metal-insulator-metal (MIM) based absorber. The proposed structure is made of a Cr-Al2O3-Cr multilayer design. At the initial step, the optimum MIM planar design is fabricated and optically characterized. The results show absorption above 0.9 from 400 nm to 850 nm. Afterward, the transfer matrix method is used to find the optimal condition for the perfect light absorption in an ultra-broadband frequency range. This modeling approach predicts that changing the filling fraction of the top Cr layer can extend light absorption toward longer wavelengths. We experimentally proved that the use of proper top Cr thickness and annealing temperature leads to a nearly perfect light absorption from 400 nm to 1150 nm, which is much broader than that of a planar design. Therefore, while keeping the overall process lithography-free, the absorption functionality of the design can be significantly improved. The results presented here can serve as a beacon for future performance-enhanced multilayer designs where a simple fabrication step can boost the overall device response without changing its overall thickness and fabrication simplicity.
dc.identifier.doi10.1364/PRJ.6.000168
dc.identifier.issn2327-9125
dc.identifier.urihttp://hdl.handle.net/11693/50393
dc.language.isoEnglish
dc.publisherOSA - The Optical Society
dc.relation.isversionofhttps://doi.org/10.1364/PRJ.6.000168
dc.source.titlePhotonics Researchen_US
dc.titleTuning the metal filling fraction in metal-insulator-metal ultra-broadband perfect absorbers to maximize the absorption bandwidthen_US
dc.typeArticleen_US
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Nanotechnology Research Center (NANOTAM)
Department of Electrical and Electronics Engineering
Department of Physics
Institute of Materials Science and Nanotechnology (UNAM)