Independent parallel lithography using the atomic force microscope

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buir.contributor.orcidAtalar, Abdullah|0000-0002-1903-1240
dc.citation.epage2461en_US
dc.citation.issueNumber4en_US
dc.citation.spage2456en_US
dc.citation.volumeNumber14en_US
dc.contributor.authorMinne, S. C.en_US
dc.contributor.authorManalis, S. R.en_US
dc.contributor.authorAtalar, Abdullahen_US
dc.contributor.authorQuate, C. F.en_US
dc.date.accessioned2015-07-28T11:56:01Z
dc.date.available2015-07-28T11:56:01Z
dc.date.issued1996-05en_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.departmentInstitute of Materials Science and Nanotechnology (UNAM)en_US
dc.description.abstractIndependent parallel features have been lithographically patterned with a 2×1 array of individually controlled cantilevers using an atomic force microscope. Control of the individual cantilevers was achieved with an integrated piezoelectric actuator in feedback with a piezoresistive sensor. Patterns were formed on 〈100〉 single crystal silicon by using a computer controlled tip voltage to locally enhance the oxidation of the silicon. Using the piezoresistor directly as a force sensor, parallel images can be simultaneously acquired in the constant force mode. A discussion of electrostatic forces due to applied tip voltages, hysteresis characteristics of the actuator, and the cantilever system is also presented.en_US
dc.identifier.doi10.1116/1.588753en_US
dc.identifier.eissn2166-2754
dc.identifier.issn2166-2746
dc.identifier.urihttp://hdl.handle.net/11693/10829
dc.language.isoEnglishen_US
dc.publisherA I P Publishing LLCen_US
dc.relation.isversionofhttp://dx.doi.org/10.1116/1.588753en_US
dc.source.titleJournal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomenaen_US
dc.subjectChemical elementsen_US
dc.subjectPiezoelectricityen_US
dc.subjectPiezoresistanceen_US
dc.subjectSensorsen_US
dc.subjectElectrostaticsen_US
dc.titleIndependent parallel lithography using the atomic force microscopeen_US
dc.typeArticleen_US
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