Integration of through-wafer interconnects with a two-dimensional cantilever array

buir.contributor.orcidAtalar, Abdullah|0000-0002-1903-1240
dc.citation.epage123en_US
dc.citation.issueNumber1-3en_US
dc.citation.spage118en_US
dc.citation.volumeNumber83en_US
dc.contributor.authorChow, E. M.en_US
dc.contributor.authorSoh, H. T.en_US
dc.contributor.authorLee, H. C.en_US
dc.contributor.authorAdams, J. D.en_US
dc.contributor.authorMinne, S. C.en_US
dc.contributor.authorYaralioglu, G. G.en_US
dc.contributor.authorAtalar, Abdullahen_US
dc.contributor.authorQuate, C. F.en_US
dc.contributor.authorKenny, T. W.en_US
dc.date.accessioned2015-07-28T12:06:39Z
dc.date.available2015-07-28T12:06:39Z
dc.date.issued2000-05-22en_US
dc.departmentDepartment of Electrical and Electronics Engineeringen_US
dc.description.abstractHigh-density through-wafer interconnects are incorporated in a two-dimensional (2D) micromachined cantilever array. The design addresses alignment and density issues associated with 2D arrays. Each cantilever has piezoresistive deflection sensors and high-aspect ratio silicon tips. The fabrication process and array operation are described. The integration of cantilevers, tips, and interconnects enables operation of a high-density 2D scanning probe array over large areas.en_US
dc.identifier.doi10.1016/S0924-4247(99)00381-7en_US
dc.identifier.issn0924-4247
dc.identifier.urihttp://hdl.handle.net/11693/13505
dc.language.isoEnglishen_US
dc.publisherElsevieren_US
dc.relation.isversionofhttp://dx.doi.org/10.1016/S0924-4247(99)00381-7en_US
dc.source.titleSensors and Actuators A: Physicalen_US
dc.subjectSensor Arrayen_US
dc.subjectScanning probe microscopeen_US
dc.subjectThrough-wafer electrical ınterconnecten_US
dc.subjectPiezoresistive silicon cantileveren_US
dc.titleIntegration of through-wafer interconnects with a two-dimensional cantilever arrayen_US
dc.typeArticleen_US
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