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      Atomic layer deposition: an enabling technology for the growth of functional nanoscale semiconductors

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      Author(s)
      Bıyıklı, Necmi
      Haider A.
      Date
      2017
      Source Title
      Semiconductor Science and Technology
      Print ISSN
      0268-1242
      Publisher
      Institute of Physics Publishing
      Volume
      32
      Issue
      9
      Language
      English
      Type
      Review
      Item Usage Stats
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      1,586
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      Abstract
      In this paper, we present the progress in the growth of nanoscale semiconductors grown via atomic layer deposition (ALD). After the adoption by semiconductor chip industry, ALD became a widespread tool to grow functional films and conformal ultra-thin coatings for various applications. Based on self-limiting and ligand-exchange-based surface reactions, ALD enabled the low-temperature growth of nanoscale dielectric, metal, and semiconductor materials. Being able to deposit wafer-scale uniform semiconductor films at relatively low-temperatures, with sub-monolayer thickness control and ultimate conformality, makes ALD attractive for semiconductor device applications. Towards this end, precursors and low-temperature growth recipes are developed to deposit crystalline thin films for compound and elemental semiconductors. Conventional thermal ALD as well as plasma-assisted and radical-enhanced techniques have been exploited to achieve device-compatible film quality. Metal-oxides, III-nitrides, sulfides, and selenides are among the most popular semiconductor material families studied via ALD technology. Besides thin films, ALD can grow nanostructured semiconductors as well using either template-assisted growth methods or bottom-up controlled nucleation mechanisms. Among the demonstrated semiconductor nanostructures are nanoparticles, nano/quantum-dots, nanowires, nanotubes, nanofibers, nanopillars, hollow and core-shell versions of the afore-mentioned nanostructures, and 2D materials including transition metal dichalcogenides and graphene. ALD-grown nanoscale semiconductor materials find applications in a vast amount of applications including functional coatings, catalysis and photocatalysis, renewable energy conversion and storage, chemical sensing, opto-electronics, and flexible electronics. In this review, we give an overview of the current state-of-the-art in ALD-based nanoscale semiconductor research including the already demonstrated and future applications.
      Keywords
      Atomic layer deposition
      IIInitride
      Metal-oxide
      Nanoscale
      Nanostructured
      Self-limiting
      Semiconductor
      Atoms
      Catalysis
      Chemical sensors
      Coatings
      Deposition
      Deposits
      Dielectric materials
      Energy conversion
      Flexible electronics
      Metal nanoparticles
      Metals
      Nanostructured materials
      Nanostructures
      Nanotechnology
      Protective coatings
      Selenium compounds
      Semiconductor devices
      Semiconductor growth
      Semiconductor materials
      Surface reactions
      Temperature
      Thin films
      Transition metals
      WSI circuits
      Yarn
      III-Nitride
      Metal oxides
      Nano scale
      Nano-structured
      self-limiting
      Atomic layer deposition
      Permalink
      http://hdl.handle.net/11693/38223
      Published Version (Please cite this version)
      https://doi.org/10.1088/1361-6641/aa7ade
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      • Institute of Materials Science and Nanotechnology (UNAM) 2260
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