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      Ab initio study of hydrogenic effective mass impurities in Si nanowires

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      Author(s)
      Peelaers, H.
      Durgun, Engin
      Partoens, B.
      Bilc, D. I.
      Ghosez, P.
      Van De Walle C. G.
      Peeters, F. M.
      Date
      2017-01
      Source Title
      Journal of Physics Condensed Matter
      Print ISSN
      0953-8984
      Publisher
      Institute of Physics Publishing
      Volume
      29
      Issue
      9
      Pages
      095303-1 - 095303-7
      Language
      English
      Type
      Article
      Item Usage Stats
      269
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      260
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      Abstract
      The effect of B and P dopants on the band structure of Si nanowires is studied using electronic structure calculations based on density functional theory. At low concentrations a dispersionless band is formed, clearly distinguishable from the valence and conduction bands. Although this band is evidently induced by the dopant impurity, it turns out to have purely Si character. These results can be rigorously analyzed in the framework of effective mass theory. In the process we resolve some common misconceptions about the physics of hydrogenic shallow impurities, which can be more clearly elucidated in the case of nanowires than would be possible for bulk Si. We also show the importance of correctly describing the effect of dielectric confinement, which is not included in traditional electronic structure calculations, by comparing the obtained results with those of G0W0 calculations.
      Keywords
      Confinement effects
      First-principles calculations
      Shallow impurities
      Si nanowires
      Calculations
      Doping (additives)
      Electronic structure
      Impurities
      Nanowires
      Silicon
      Confinement effects
      Dielectric confinement
      Effective-mass theory
      Electronic structure calculations
      First-principles calculation
      Low concentrations
      Shallow impurities
      Si nanowire
      Density functional theory
      Permalink
      http://hdl.handle.net/11693/37172
      Published Version (Please cite this version)
      https://doi.org/10.1088/1361-648X/aa5768
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      • Institute of Materials Science and Nanotechnology (UNAM) 2258
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