Determination of Plasma Temperature of Copper Vapour laser
Date
2016Source Title
Journal of Plasma Physics
Print ISSN
0022-3778
Publisher
Cambridge University Press
Volume
82
Issue
1
Pages
1
Language
English
Type
ArticleItem Usage Stats
230
views
views
224
downloads
downloads
Abstract
The output power and the temperature profile of a copper vapour laser were investigated versus frequency with various kinds of back mirror in its resonator cavity. A semi-experimental method was used for measuring the plasma temperature and obtaining the temperature profile with various back mirrors. The obtained plasma temperature through this method has good agreement with the operational temperature of the laser.
Keywords
CopperElectron temperature
Mirrors
Temperature control
Back mirrors
Copper vapour laser
Experimental methods
Operational temperature
Output power
Plasma temperature
Resonator cavities
Temperature profiles
Laser mirrors
Permalink
http://hdl.handle.net/11693/36756Published Version (Please cite this version)
http://dx.doi.org/10.1017/S0022377816000052Collections
Related items
Showing items related by title, author, creator and subject.
-
Electrospinning of functional poly(methyl methacrylate) nanofibers containing cyclodextrin-menthol inclusion complexes
(Institute of Physics Publishing, 2009)Electrospinning of nanofibers with cyclodextrin inclusion complexes (CD-ICs) is particularly attractive since distinct properties can be obtained by combining the nanofibers with specific functions of the CD-ICs. Here we ... -
Electrical conduction properties of Si δ-doped GaAs grown by MBE
(2009)The temperature dependent Hall effect and resistivity measurements of Si δ-doped GaAs are performed in a temperature range of 25-300 K. The temperature dependence of carrier concentration shows a characteristic minimum at ... -
Digitally alloyed ZnO and TiO2 thin film thermistors by atomic layer deposition for uncooled microbolometer applications
(AVS Science and Technology Society, 2017)The authors demonstrate the digital alloying of ZnO and TiO2 via atomic layer deposition method to be utilized as the active material of uncooled microbolometers. Depositions are carried out at 200 °C. Crystallinity of the ...
