Area-selective atomic layer deposition using an inductively coupled plasma polymerized fluorocarbon layer: A case study for metal oxides
Date
2016
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Source Title
Journal of Physical Chemistry C
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American Chemical Society
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Alumina, Aluminum compounds, Deposition, Hafnium oxides, II-VI semiconductors, Inductively coupled plasma, Metallic compounds, Metals, Nucleation, Oxide films, Polymer films, Polymers, Scanning electron microscopy, Semiconducting films, Silicon compounds, Thin films, X ray photoelectron spectroscopy, Zinc oxide, Fluorocarbon polymer film, Growth inhibition, Metal oxide materials, Nucleation behavior, Pattern placements, Plasma-polymerized fluorocarbons, Selective deposition, Spectroscopic ellipsometers, Atomic layer deposition
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English