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      Atomic Layer Deposition for Vertically Integrated ZnO Thin Film Transistors: Toward 3D High Packing Density Thin Film Electronics

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      Embargo Lift Date: 2018-09-18
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      Author(s)
      Sisman, Z.
      Bolat, S.
      Okyay, Ali Kemal
      Date
      2017
      Source Title
      Physica Status Solidi (C) Current Topics in Solid State Physics
      Print ISSN
      1862-6351
      Publisher
      Wiley-VCH Verlag
      Volume
      14
      Issue
      9
      Language
      English
      Type
      Article
      Item Usage Stats
      143
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      66
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      Abstract
      We report on the first demonstration of the atomic layer deposition (ALD) based three dimensional (3D) integrated ZnO thin film transistors (TFTs) on rigid substrates. Devices exhibit high on-off ratio (∼106) and high effective mobility (∼11.8 cm2 V−1 s−1). It has also been demonstrated that the steps of fabrication result in readily stable electrical characteristics in TFTs, eliminating the need for post-production steps. These results mark the potential of our fabrication method for the semiconducting metal oxide-based vertical-integrated circuits requiring high packing density and high functionality. © 2017 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
      Keywords
      3D integration
      Atomic layer deposition
      Thin film transistors
      Atomic layer deposition
      Atoms
      Deposition
      Metallic films
      Metals
      Optical films
      Thin film transistors
      Thin films
      Zinc oxide
      3-D integration
      Effective mobilities
      Electrical characteristic
      Fabrication method
      High packing density
      Semi-conducting metal oxides
      Thin film electronics
      Threedimensional (3-d)
      Thin film circuits
      Permalink
      http://hdl.handle.net/11693/36395
      Published Version (Please cite this version)
      https://doi.org/10.1002/pssc.201700128
      Collections
      • Department of Electrical and Electronics Engineering 3868
      • Institute of Materials Science and Nanotechnology (UNAM) 2098
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