Preparation of Al 2O 3and AlN nanotubes by atomic layer deposition
Date
2012Source Title
Materials Research Society Symposium Proceedings
Print ISSN
0272-9172
Publisher
Cambridge University Press
Volume
1408
Pages
133 - 138
Language
English
Type
Conference PaperItem Usage Stats
165
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283
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Abstract
Al 2O 3 and AlN nanotubes were fabricated by depositing conformal thin films via atomic layer deposition (ALD) on electrospun nylon 66 (PA66) nanofiber templates. Depositions were carried out at 200°C, using trimethylaluminum (TMAl), water (H 2O), and ammonia (NH 3) as the aluminum, oxygen, and nitrogen precursors, respectively. Deposition rates of Al 2O 3 and AlN at this temperature were ∼1.05 and 0.86 Å/cycle. After the depositions, Al 2O 3- and AlN-coated nanofibers were calcinated at 500°C for 2 h in order to remove organic components. Nanotubes were characterized by using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). AlN nanotubes were polycrystalline as determined by high resolution TEM (HR-TEM) and selected area electron diffraction (SAED). TEM images of all the samples reported in this study indicated uniform wall thicknesses. © 2012 Materials Research Society.
Keywords
AlNElectrospuns
High-resolution TEM
Nylon 66
Organic components
Polycrystalline
Selected area electron diffraction
TEM images
Transmission electron microscopy tem
Trimethylaluminum
Wall thickness
Aluminum
Aluminum nitride
Atomic layer deposition
Deposition
Electron diffraction
Nanofibers
Nanowires
Photoelectrons
Scanning electron microscopy
Transmission electron microscopy
X ray photoelectron spectroscopy
Nanotubes
Permalink
http://hdl.handle.net/11693/28169Published Version (Please cite this version)
http://dx.doi.org/10.1557/opl.2012.38Collections
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