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      Reductive deposition of Au3+(aq) on oxidized silicon surfaces

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      Author
      Süzer, Ş.
      Dag, Ö.
      Date
      2000
      Source Title
      Canadian Journal of Chemistry
      Print ISSN
      0008-4042
      Publisher
      N R C Research Press
      Volume
      78
      Issue
      4
      Pages
      516 - 519
      Language
      English
      Type
      Article
      Item Usage Stats
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      Abstract
      X-ray photoelectron spectroscopy (XPS) is used to determine the oxidation state of gold deposited from an aqueous solution of AuCl4- on to various oxidized surfaces of silicon. Although the observed Au4f signal decreased with the thickness of the oxide layer, the oxidation state of Au was determined as 0 for all the samples analyzed. From the angular dependence of the Si2p and Au4f signals it was determined that Au is deposited on top of the oxidized surfaces of metallic silicon. It is postulated that from an aqueous solution of AuCl4-, gold would deposit in its zerovalent form on to any surface due to its large and positive electrochemical reduction potential (ε° (red) (Au3+/Au) = +1.50 V) and the substrate plays a role only in providing active deposition sites. To further support the proposal, it is shown that the same process takes place even in inert and hydrophobic polypropylene substrates. Similarly, it is also shown that more gold deposits if the surface of the polypropylene is made less hydrophobic (but probably more active) via the industrially used corona discharge treatment.
      Keywords
      Electroless deposition
      Gold
      Oxidized silicon surface
      XPS
      Electrochemistry
      Hydrophobicity
      Oxidation reduction reaction
      X ray spectrometry
      Permalink
      http://hdl.handle.net/11693/25098
      Published Version (Please cite this version)
      https://doi.org/10.1139/v00-039
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