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dc.contributor.authorSuzer, S.en_US
dc.date.accessioned2016-02-08T10:28:02Z
dc.date.available2016-02-08T10:28:02Z
dc.date.issued2003en_US
dc.identifier.issn0003-2700
dc.identifier.urihttp://hdl.handle.net/11693/24351
dc.description.abstractWe apply a negative bias to the sample while recording an XPS spectrum to enhance differential (positive) charging. The enhanced differential charging is due to the repulsion of stray electrons from the sample, which normally cause partial neutralization of the poorly conducting samples or regions accumulating positive charging, as a consequence of the photoelectron emission. This enhanced differential charging (obtained by negative biasing) is shown to have the ability to separate otherwise overlapping peaks of PDMS layer from that of the SiO2/Si substrate. Each layer experiences different charging that can be used to derive information related to dielectric properties of the layers, proximity of the atoms within composite multilayers, or both. Hence, differential charging in XPS, which is usually considered as a nuisance, is turned into a useful tool for extracting additional information from nanometer-size surface structures.en_US
dc.language.isoEnglishen_US
dc.source.titleAnalytical Chemistryen_US
dc.relation.isversionofhttp://dx.doi.org/10.1021/ac034823ten_US
dc.subjectDifferential chargingen_US
dc.subjectDielectric propertiesen_US
dc.subjectElectronsen_US
dc.subjectPhotoemissionen_US
dc.subjectSilicaen_US
dc.subjectX ray photoelectron spectroscopyen_US
dc.subjectNanoparticleen_US
dc.titleDifferential charging in x-ray photoelectron spectroscopy: a nuisance or a useful tool?en_US
dc.typeArticleen_US
dc.departmentDepartment of Chemistry
dc.citation.spage7026en_US
dc.citation.epage7029en_US
dc.citation.volumeNumber75en_US
dc.citation.issueNumber24en_US
dc.identifier.doi10.1021/ac034823ten_US
dc.publisherAmerican Chemical Societyen_US


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