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      Differential charging in x-ray photoelectron spectroscopy: a nuisance or a useful tool?

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      Author(s)
      Süzer, Şefik
      Date
      2003
      Source Title
      Analytical Chemistry
      Print ISSN
      0003-2700
      Publisher
      American Chemical Society
      Volume
      75
      Issue
      24
      Pages
      7026 - 7029
      Language
      English
      Type
      Article
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      Abstract
      We apply a negative bias to the sample while recording an XPS spectrum to enhance differential (positive) charging. The enhanced differential charging is due to the repulsion of stray electrons from the sample, which normally cause partial neutralization of the poorly conducting samples or regions accumulating positive charging, as a consequence of the photoelectron emission. This enhanced differential charging (obtained by negative biasing) is shown to have the ability to separate otherwise overlapping peaks of PDMS layer from that of the SiO2/Si substrate. Each layer experiences different charging that can be used to derive information related to dielectric properties of the layers, proximity of the atoms within composite multilayers, or both. Hence, differential charging in XPS, which is usually considered as a nuisance, is turned into a useful tool for extracting additional information from nanometer-size surface structures.
      Keywords
      Differential charging
      Dielectric properties
      Electrons
      Photoemission
      Silica
      X ray photoelectron spectroscopy
      Nanoparticle
      Permalink
      http://hdl.handle.net/11693/24351
      Published Version (Please cite this version)
      http://dx.doi.org/10.1021/ac034823t
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