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      Energy relaxation of electrons in InGaN quantum wells

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      Author(s)
      Sarikavak-Lisesivdin, B.
      Lisesivdin, S. B.
      Balkan, N.
      Atmaca, G.
      Narin, P.
      Cakmak, H.
      Özbay, Ekmel
      Date
      2015-04
      Source Title
      Metallurgical and Materials Transactions A - Physical Metallurgy and Materials Science
      Print ISSN
      1073-5623
      Publisher
      Springer New York LLC
      Volume
      46
      Issue
      4
      Pages
      1565 - 1569
      Language
      English
      Type
      Article
      Item Usage Stats
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      230
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      Abstract
      In this study, electron energy relaxation mechanisms in HEMT structures with different InxGa1−xN-channel quantum well (QW) widths are investigated. Theoretical value of the inelastic scattering rates is carried out at electron temperatures between 30 K (−243 °C) < Te < 700 K (427 °C). We used both the experimentally determined and calculated electron temperatures to estimate the energy relaxation rates of non-equilibrium electrons. In wide InGaN QWs, power loss of an electron is shown to be significantly smaller than that in the narrower QWs. © 2015, The Minerals, Metals & Materials Society and ASM International.
      Keywords
      Electron energy levels
      Electrons
      High electron mobility transistors
      Inelastic scattering
      Semiconducting indium compounds
      Semiconductor quantum wells
      Electron energies
      Energy relaxation
      Inelastic scattering rate
      InGaN quantum wells
      N-channel
      Non-equilibrium electrons
      Power-losses
      Theoretical values
      Electron temperature
      Permalink
      http://hdl.handle.net/11693/24148
      Published Version (Please cite this version)
      http://dx.doi.org/10.1007/s11661-015-2762-2
      Collections
      • Department of Electrical and Electronics Engineering 4011
      • Department of Physics 2550
      • Nanotechnology Research Center (NANOTAM) 1179
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