Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films

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Abstract

Here, we report on the current transport mechanisms in AlN thin films deposited at a low temperature (i.e., 200°C) on p-type Si substrates by plasma-enhanced atomic layer deposition. Structural characterization of the deposited AlN was carried out using grazing-incidence X-ray diffraction, revealing polycrystalline films with a wurtzite (hexagonal) structure. Al/AlN/ p-Si metal-insulator-semiconductor (MIS) capacitor structures were fabricated and investigated under negative bias by performing current-voltage measurements. As a function of the applied electric field, different types of current transport mechanisms were observed; i.e., ohmic conduction (15.2-21.5 MV/m), Schottky emission (23.6-39.5 MV/m), Frenkel-Poole emission (63.8-211.8 MV/m), trap-assisted tunneling (226-280 MV/m), and Fowler-Nordheim tunneling (290-447 MV/m). Electrical properties of the insulating AlN layer and the fabricated Al/AlN/p-Si MIS capacitor structure such as dielectric constant, flat-band voltage, effective charge density, and threshold voltage were also determined from the capacitance-voltage measurements.

Source Title

Journal of Applied Physics

Publisher

A I P Publishing LLC

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Keywords

Aluminum, Atomic layer deposition, Capacitors, Electric fields, Metal insulator boundaries, MIS devices, MOS capacitors, Semiconducting silicon, Silicon, Temperature, Thin films, Threshold voltage, Voltage measurement, X ray diffraction, Zinc sulfide, Capacitance voltage measurements, Current transport mechanism, Current voltage measurement, Grazing incidence X-ray diffraction, Metal insulator semiconductor capacitors, Plasma-enhanced atomic layer deposition, Structural characterization, Trap assisted tunneling, Deposition

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Citation

Published Version (Please cite this version)

Language

English