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dc.contributor.authorGenisel, M. F.en_US
dc.contributor.authorUddin, M. N.en_US
dc.contributor.authorSay, Z.en_US
dc.contributor.authorKulakci, M.en_US
dc.contributor.authorTuran, R.en_US
dc.contributor.authorGulseren, O.en_US
dc.contributor.authorBengu, E.en_US
dc.date.accessioned2016-02-08T09:50:49Z
dc.date.available2016-02-08T09:50:49Z
dc.date.issued2011en_US
dc.identifier.issn0021-8979
dc.identifier.urihttp://hdl.handle.net/11693/21763
dc.description.abstractIn this study, we implanted Nþ and Nþ 2 ions into sputter deposited amorphous boron carbide (a-BC) and diamond like carbon (DLC) thin films in an effort to understand the chemical bonding involved and investigate possible phase separation routes in boron carbon nitride (BCN) films. In addition, we investigated the effect of implanted Cþ ions in sputter deposited amorphous boron nitride (a-BN) films. Implanted ion energies for all ion species were set at 40 KeV. Implanted films were then analyzed using x-ray photoelectron spectroscopy (XPS). The changes in the chemical composition and bonding chemistry due to ion-implantation were examined at different depths of the films using sequential ion-beam etching and high resolution XPS analysis cycles. A comparative analysis has been made with the results from sputter deposited BCN films suggesting that implanted nitrogen and carbon atoms behaved very similar to nitrogen and carbon atoms in sputter deposited BCN films. We found that implanted nitrogen atoms would prefer bonding to carbon atoms in the films only if there is no boron atom in the vicinity or after all available boron atoms have been saturated with nitrogen. Implanted carbon atoms also preferred to either bond with available boron atoms or, more likely bonded with other implanted carbon atoms. These results were also supported by ab-initio density functional theory calculations which indicated that carbon-carbon bonds were energetically preferable to carbon-boron and carbon-nitrogen bonds.en_US
dc.language.isoEnglishen_US
dc.source.titleJournal of Applied Physicsen_US
dc.relation.isversionofhttp://dx.doi.org/10.1063/1.3638129en_US
dc.subjectAb initioen_US
dc.subjectAmorphous boronen_US
dc.subjectAmorphous boron nitrideen_US
dc.subjectBCN filmsen_US
dc.subjectBonding behavioren_US
dc.subjectBoron atomen_US
dc.subjectBoron carbon nitrideen_US
dc.subjectCarbon atomsen_US
dc.subjectCarbon-carbon bonden_US
dc.subjectChemical bondingsen_US
dc.subjectChemical compositionsen_US
dc.subjectComparative analysisen_US
dc.subjectDensity functional theory calculationsen_US
dc.subjectDiamond like carbonen_US
dc.subjectHigh resolutionen_US
dc.subjectImplanted nitrogenen_US
dc.subjectIon beam etchingen_US
dc.subjectIon energiesen_US
dc.subjectIon implanteden_US
dc.subjectIon speciesen_US
dc.subjectNitrogen atomen_US
dc.subjectXPS analysisen_US
dc.subjectAmorphous carbonen_US
dc.subjectAmorphous filmsen_US
dc.subjectAtomsen_US
dc.subjectBoronen_US
dc.subjectBoron carbideen_US
dc.subjectCarbon filmsen_US
dc.subjectChemical analysisen_US
dc.subjectChemical bondsen_US
dc.subjectDensity functional theoryen_US
dc.subjectIonsen_US
dc.subjectNitridesen_US
dc.subjectNitrogenen_US
dc.subjectPhase separationen_US
dc.subjectPhotoelectron spectroscopyen_US
dc.subjectX ray photoelectron spectroscopyen_US
dc.subjectDiamond like carbon filmsen_US
dc.titleBias in bonding behavior among boron, carbon, and nitrogen atoms in ion implanted a-BN, a-BC, and diamond like carbon filmsen_US
dc.typeArticleen_US
dc.departmentDepartment of Chemistry
dc.departmentDepartment of Physics
dc.citation.volumeNumber110en_US
dc.citation.issueNumber7en_US
dc.identifier.doi10.1063/1.3638129en_US
dc.identifier.eissn1089-7550


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