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      Low-loss as-grown germanosilicate layers for optical waveguides

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      Author(s)
      Ay, F.
      Aydınlı, Atilla
      Agan, S.
      Date
      2003
      Source Title
      Applied Physics Letters
      Print ISSN
      0003-6951
      Electronic ISSN
      1520-8842
      Publisher
      A I P Publishing LLC
      Volume
      83
      Issue
      23
      Pages
      4743 - 4745
      Language
      English
      Type
      Article
      Item Usage Stats
      141
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      114
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      Abstract
      We report on systematic growth and characterization of low-loss germanosilicate layers for use in optical waveguide technology. The films were deposited by plasma-enhanced chemical vapor deposition technique using silane, germane, and nitrous oxide as precursor gases. Fourier transform infrared spectroscopy was used to monitor the compositional properties of the samples. It was found that addition of germane leads to decreasing of N-H- and O-H-related bonds. The propagation loss values of the planar waveguides were correlated with the decrease in the hydrogen-related bonds of the as-deposited waveguides and resulted in very low values, eliminating the need for high-temperature annealing as is usually done.
      Keywords
      Thin-films
      Hydrogen
      Glass
      Permalink
      http://hdl.handle.net/11693/11291
      Published Version (Please cite this version)
      http://dx.doi.org/ 10.1063/1.1631753
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      • Department of Physics 2397
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