Field-effect-assisted photoconductivity in PbS films deposited on silicon dioxide
Journal of Applied Physics
American Institute of Physics
5782 - 5782
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Pintilie, L., Pentia, E., Matei, I., Pintilie, I., & Ozbay, E. (2002). Field-effect-assisted photoconductivity in PbS films deposited on silicon dioxide. Journal of applied physics, 91(9), 5782-5786.
Please cite this item using this persistent URLhttp://hdl.handle.net/11693/11214
Lead sulfide (PbS) thin films were deposited from a chemical bath onto SiO2/Si (n-type) substrates. Pseudo-metal-oxide-semiconductor devices were obtained by evaporating source and drain gold electrodes on a PbS surface and aluminum gate electrode on a Si substrate. Field-effect-assisted photoconductivity in the PbS layer was investigated at room temperature, in the 800-2700-nm-wavelength domain for different values and polarities of the drain and gate voltages. The best results were obtained for a positive gate, when both semiconductors are in depletion. An enhancement of about 25% of the photoconductive signal is obtained compared with the case when the gate electrode is absent or is not used. A simple model is proposed that explains the behavior of the dark current and photoconductive signal in PbS film with changing the gate voltage. (C) 2002 American Institute of Physics.