• About
  • Policies
  • What is open access
  • Library
  • Contact
Advanced search
      View Item 
      •   BUIR Home
      • Scholarly Publications
      • Nanotechnology Research Center (NANOTAM)
      • View Item
      •   BUIR Home
      • Scholarly Publications
      • Nanotechnology Research Center (NANOTAM)
      • View Item
      JavaScript is disabled for your browser. Some features of this site may not work without it.

      Analysis of HfO2 and ZrO2 as high-K dielectric for CMOS nano devices

      Thumbnail
      View / Download
      2.0 Mb
      Author(s)
      Hasan, T.
      Zafar, Salahuddin
      Özbay, Ekmel
      Kashif, A. U.
      Date
      2022-05-16
      Source Title
      International Conf on Electrical and Electronic Engineering (ICEEE)
      Publisher
      Institute of Electrical and Electronics Engineers
      Pages
      99 - 103
      Language
      English
      Type
      Conference Paper
      Item Usage Stats
      5
      views
      3
      downloads
      Abstract
      An analysis has been made on high-K dielectrics (HfO 2 and ZrO 2) for the CMOS process up to 14 nm FAB technology node. The aim is to study the reduction in gate leakage current for Nano-scale devices. High-K Dielectric having K ≥ 20 is beneficial for CMOS Nano-devices, reducing the gate leakage current when EOT ≤ 0.5 nm. MOS structure with high-K, i.e., HfO 2 and ZrO 2 , has been simulated in SILVACO T-CAD to consider as gate stack: metal/oxide/p-Si for the different FAB nodes; 45, 32, 22 & 14 nm. SiO 2 is considered a reference to optimize the MOS structure with high-K dielectric. As a result, 7–8 times the higher physical gate oxide layer is achieved compared to SiO 2 , which has a significant impact on minimizing the gate leakage current.
      Keywords
      CMOS
      High-K dielectric
      E.O.T
      ITRS
      FAB node
      TCAD
      Permalink
      http://hdl.handle.net/11693/111881
      Published Version (Please cite this version)
      https://doi.org/10.1109/ICEEE55327.2022.9772574
      Collections
      • Nanotechnology Research Center (NANOTAM) 1179
      Show full item record

      Browse

      All of BUIRCommunities & CollectionsTitlesAuthorsAdvisorsBy Issue DateKeywordsTypeDepartmentsCoursesThis CollectionTitlesAuthorsAdvisorsBy Issue DateKeywordsTypeDepartmentsCourses

      My Account

      Login

      Statistics

      View Usage StatisticsView Google Analytics Statistics

      Bilkent University

      If you have trouble accessing this page and need to request an alternate format, contact the site administrator. Phone: (312) 290 2976
      © Bilkent University - Library IT

      Contact Us | Send Feedback | Off-Campus Access | Admin | Privacy