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      Lithography-free metamaterial absorbers: Opinion

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      Author(s)
      Ghobadi, Amir
      Ulusoy Ghobadi, Türkan Gamze
      Özbay, Ekmel
      Date
      2022-02-01
      Source Title
      Optical Materials Express
      Print ISSN
      21593930
      Publisher
      The Optical Society
      Volume
      12
      Issue
      2
      Pages
      524 - 532
      Language
      English
      Type
      Article
      Item Usage Stats
      11
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      Abstract
      Although advancement in nanofabrication provides the opportunity to realize nanoscale geometries with high resolutions, the scalability and repeatability issues limit their large-scale applications. Lithography-free metamaterial absorbers (LFMAs) are a potential route for the upscaling of these designs. With restricted freedom in their synthesis, the importance of the proper material choice is emphasized. Herein, we provide a comprehensive overview of the recently developed LFMAs, from both design and material perspectives, while considering their most promising applications. © 2022 Optica Publishing Group under the terms of the Optica Open Access Publishing Agreement
      Keywords
      Lithography
      Nanotechnology
      Permalink
      http://hdl.handle.net/11693/111877
      Published Version (Please cite this version)
      https://dx.doi.org/10.1364/OME.448363
      Collections
      • Department of Electrical and Electronics Engineering 4011
      • Department of Physics 2550
      • Institute of Materials Science and Nanotechnology (UNAM) 2258
      • Nanotechnology Research Center (NANOTAM) 1179
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