XPS investigation of thin SiOx and SiOxNy overlayers
Date
1999-05-04
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Abstract
Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon. (C) 1999 Elsevier Science B.V. All rights reserved.
Source Title
Journal of Molecular Structure
Publisher
Elsevier
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English