XPS investigation of thin SiOx and SiOxNy overlayers

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Author
Birer, O.
Sayan, S.
Süzer, Şefik
Aydınlı, Atilla
Date
1999-05-04
Source Title
Journal of Molecular Structure
Print ISSN
0022-2860
Publisher
Elsevier
Volume
481
Issue
SI
Pages
611 - 614
Language
English
Type
Article
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Abstract
Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon. (C) 1999 Elsevier Science B.V. All rights reserved.
Keywords
Angle-resolved Xps
Thickness Determination
Siliconoxynitrides
Permalink
http://hdl.handle.net/11693/11100
Published Version (Please cite this version)
http://dx.doi.org/10.1016/S0022-2860(98)00943-0
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