XPS investigation of thin SiOx and SiOxNy overlayers

Thumbnail
View/Open
Author
Birer, O.
Sayan, S.
Suzer, S.
Aydinli, A.
Date
1999-05-04
Journal Title
Journal of Molecular Structure
Print ISSN
0022-2860
Publisher
Elsevier
Volume
481
Issue
SI
Pages
611 - 614
Language
English
Type
Article
Item Usage Stats
24
views
14
downloads
Metadata
Show full item record
Please cite this item using this persistent URL
http://hdl.handle.net/11693/11100
Abstract
Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon. (C) 1999 Elsevier Science B.V. All rights reserved.
Published as
http://dx.doi.org/10.1016/S0022-2860(98)00943-0
Keywords
Angle-resolved Xps
Thickness Determination
Siliconoxynitrides
Collections