XPS investigation of thin SiOx and SiOxNy overlayers

Date

1999-05-04

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Abstract

Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon. (C) 1999 Elsevier Science B.V. All rights reserved.

Source Title

Journal of Molecular Structure

Publisher

Elsevier

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Published Version (Please cite this version)

Language

English