XPS investigation of thin SiO(x) and SiO(x)N(y) overlayers
Please cite this item using this persistent URLhttp://hdl.handle.net/11693/27851
Journal of Molecular Structure
- Conference Paper 
Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon.