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    • Soft x-ray photoemission studies of the HfO2/SiO2/Si system 

      Sayan, S.; Garfunkel, E.; Suzer, S. (American Institute of Physics, 2002)
      Soft x-ray photoelectron spectroscopy with synchrotron radiation was employed to study the valence-band offsets for the HfO2/SiO 2/Si and HfO2/SiOxNy/Si systems. We obtained a valence-band offset difference of -1.05±0.1eV ...