Now showing items 1-1 of 1

    • Charge trapping memory with 2.85-nm Si-nanoparticles embedded in HfO<inf>2</inf> 

      El-Atab, N.; Turgut, Berk Berkan; Okyay, Ali K.; Nayfeh, A. (Electrochemical Society Inc., 2015)
      In this work, the effect of embedding 2.85-nm Si-nanoparticles charge trapping layer in between double layers of high-κ Al<inf>2</inf>O<inf>3</inf>/HfO<inf>2</inf> oxides is studied. Using high frequency (1 MHz) ...