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    • TiO2 thin film transistor by atomic layer deposition 

      Okyay, Ali Kemal; Oruç, Feyza B.; Çimen, Furkan; Aygün, Levent E. (SPIE, 2013)
      In this study, TiO2 films were deposited using thermal Atomic Layer Deposition (ALD) system. It is observed that asdeposited ALD TiO 2 films are amorphous and not suitable as TFT channel material. In order to use the film ...