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    • XPS investigation of thin SiOx and SiOxNy overlayers 

      Birer, O.; Sayan, S.; Süzer, Şefik; Aydınlı, Atilla (Elsevier, 1999-05-04)
      Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon. (C) 1999 ...