Browsing by Keywords "Self-limiting growth"
Now showing items 1-3 of 3
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Low - temperature self - limiting growth of III - nitride thin films by plasma - enhanced atomic layer deposition
(American Scientific Publishers, 2012)We report on the low-temperature self-limiting growth and characterization of III-Nitride thin films. AlN and GaN films were deposited by plasma-enhanced atomic layer deposition (PEALD) on various substrates using ... -
Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition
(2012)We report on the self-limiting growth and characterization of aluminum nitride (AlN) thin films. AlN films were deposited by plasma-enhanced atomic layer deposition on various substrates using trimethylaluminum (TMA) and ... -
Structural properties of AIN films deposited by plasma-enhanced atomic layer deposition at different growth temperatures
(Wiley, 2012)Crystalline aluminum nitride (AlN) films have been prepared by plasma-enhanced atomic layer deposition (PEALD) within the temperature range from 100 to 500 °C. A self-limiting, constant growth rate per cycle temperature ...