Browsing by Keywords "Plasma-Enhanced Atomic Layer Deposition"
Now showing items 1-3 of 3
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Atomic layer deposition of III-nitrides and metal oxides : their application in area selective ALD
(Bilkent University, 2017-07)III-nitride compound semiconductor materials (GaN, AlN, and InN) and their alloys have generated significant interest in both basic research and commercial applications mainly in the field of photonics, energy storage, ... -
Atomic layer deposition of metal oxide thin films and nanostructures
(Bilkent University, 2013)With the continuing scaling down of microelectronic integrated circuits and increasing need for three-dimensional stacking of functional layers, novel or improved growth techniques are required to deposit thin films with ... -
Growth and characterization of boron nitride thin films and nanostructures using atomic layer deposition = Bor nitrür ince filmlerin ve nanoyapıların atomik katman biriktirme yöntemi ile büyütülmesi ve karakterizasyonu
(Bilkent University, 2014)Being a member of III-nitride family, boron nitride (BN) and its nanostructures have recently attracted a lot of attention, mainly due to their distinctive and superior material properties, including wide band gap, ...
