Browsing by Keywords "Low temperature growth"

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Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition

Haider, Ali; Kizir, Seda; Deminskyi, P.; Tsymbalenko, Oleksandr; Leghari, Shahid Ali; Bıyıklı, Necmi; Alevli, M.; Gungor, N. (IEEE, 2016)

GaN thin films grown by hollow cathode plasma-assisted atomic layer deposition (HCPA-ALD) at two different substrate temperatures (250 and 450 °C) are compared. Effect of two different Ga source materials named as ...
Self-limiting low-temperature growth of crystalline AlN thin films by plasma-enhanced atomic layer deposition

Ozgit, C.; Donmez I.; Alevli, M.; Bıyıklı, Necmi (2012)

We report on the self-limiting growth and characterization of aluminum nitride (AlN) thin films. AlN films were deposited by plasma-enhanced atomic layer deposition on various substrates using trimethylaluminum (TMA) and ...
Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition

Kizir, S.; Haider, A.; Bıyıklı, Necmi (AVS Science and Technology Society, 2016)

Gallium nitride (GaN) thin films were grown on Si (100), Si (111), and c-plane sapphire substrates at 200 ï¿½C via hollow-cathode plasma-assisted atomic layer deposition (HCPA-ALD) using GaEt3 and N2/H2 plasma as group-III ...