Browsing by Keywords "GaN"
Now showing items 1-20 of 28
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A1GaN UV photodetectors : from micro to nano
(Bilkent University, 2011)The absorption edge of AlGaN based alloys can be tuned from deep UV to near UV by changing the composition. This enables the use of the material in various technological applications such as military, environmental ... -
Atomic layer deposited HfO2 based metal insulator semiconductor GaN ultraviolet photodetectors
(Elsevier BV, 2014)A report on GaN based metal insulator semiconductor (MIS) ultraviolet (UV) photodetectors (PDs) with atomic layer deposited (ALD) 5-nm-thick HfO2 insulating layer is presented. Very low dark current of 2.24 × 10-11 A and ... -
Blue InGaN/GaN-based quantum electroabsorption modulators
(2006)We introduce InGaN/GaN-based quantum electroabsorption modulator that incorporates ∼5 nm thick In0.35Ga0.65N/GaN quantum structures for operation in the blue spectral range of 420-430 nm. This device exhibits an optical ... -
Complementary and alternative technique for the determination of electron effective mass: Quantum hall effect
(Taylor & Francis Inc., 2016)The quantum Hall effect measurements in the AlInN/AlN/GaN heterostructure are studied in the temperature range from 1.8 K to 14 K and a magnetic field up to 11 T. The quantized two-dimensional electron gas was placed at ... -
Effect of gate structures on the DC and RF performance of AlGaN/GaN HEMTs
(Institute of Physics Publishing, 2018)This work analyzes the effect of various gate structures on the DC and radio frequency (RF) performance of AlGaN/GaN high-electron mobility transistors (HEMTs). AlGaN/GaN HEMT devices with a 3 μm drain-to-source spacing, ... -
Effect of substrate temperature and Ga source precursor on growth and material properties of GaN grown by hollow cathode plasma assisted atomic layer deposition
(Institute of Electrical and Electronics Engineers Inc., 2016)GaN thin films grown by hollow cathode plasma-assisted atomic layer deposition (HCPA-ALD) at two different substrate temperatures (250 and 450 °C) are compared. Effect of two different Ga source materials named as ... -
Electrical properties and device applications of atomic layer deposited ZnO and GaN thin films
(Bilkent University, 2014)Zinc oxide (ZnO), a semiconducting material with a wide band gap of 3.37 eV, has become a promising material for wide range of electronic and optoelectronic applications. One of the most important properties of this ... -
Fabrication and characterization of graphene/AlGaN/GaN ultraviolet Schottky photodetector
(Institute of Physics Publishing, 2016)We report on the fabrication and characterization of a Schottky ultraviolet graphene/AlGaN/GaN photodetector (PD). The fabricated device clearly exhibits rectification behaviour, indicating that the Schottky barrier is ... -
Fabrication of ALN/GAN MIS-Hemt with SIN as gate dielectric and performance enhancement with ALD deposited alumina
(Bilkent University, 2016-11)Silicon based transistors reached a limit, especially for high power and high frequency applications due to their relatively low bandgap and breakdown voltage. With its higher bandgap and breakdown voltage, GaN based ... -
GaN/AlGaN-based UV photodetectors with performances exceeding the PMTS
(Bilkent University, 2008)The recent developments in high Al-content AlxGa1−xN material growth technology made it possible to fabricate high performance solar-blind photodetectors operating in the ultraviolet (UV) spectral region with improved receiver ... -
The growth, fabrication and characterization of high performance AI(formula)Ga(formula)N metal-semiconductor-metal photodiodes
(Bilkent University, 2006)High performance UV photodetectors have attracted unwarranted attention for various applications, such as in military, telecommunication, and biological imaging, as an AlxGa1-xN material system is also rather suitable ... -
High-speed visible-blind GaN-based ITO-Schottky photodiodes
(2002)In this paper we present our efforts on the design, fabrication and characterization of high-speed, visible-blind, GaN-based ultra-violet (UV) photodiodes using indium-tin-oxide (ITO) Schottky contacts. ITO is known as a ... -
Improvement of breakdown characteristics in AlGaN/GaN/AlxGa 1-xN HEMT based on a grading Al xGa 1-xN buffer layer
(Wiley, 2010-08-03)To improve the breakdown characteristics of an AlGaN/GaN based high electron mobility transistor (HEMT) for high voltage applications, AlGaN/GaN/Al xGa 1-xN double heterostructure (DH-HEMTs) were designed and fabricated ... -
InGaN green light emitting diodes with deposited nanoparticles
(Elsevier BV, 2007)We grew an InGaN/GaN-based light-emitting diode (LED) wafer by metal-organic chemical vapor deposition (MOCVD), fabricated devices by optical lithography, and successfully deposited ellipsoidal Ag nano-particles by way of ... -
Investigation of native oxide removing from HCPA ALD grown GaN thin films surface utilizing HF solutions
(Institute of Electrical and Electronics Engineers Inc., 2016)The paper consider oxygen contamination of HCPA ALD grown GaN films under an air conditioning and during different time duration. High resolution XPS analysis of HCPA ALD grown GaN films after diluted 1:10 HF(41 %) : H2O ... -
Low - temperature self - limiting growth of III - nitride thin films by plasma - enhanced atomic layer deposition
(American Scientific Publishers, 2012)We report on the low-temperature self-limiting growth and characterization of III-Nitride thin films. AlN and GaN films were deposited by plasma-enhanced atomic layer deposition (PEALD) on various substrates using ... -
Low-frequency time-domain characterization for fast and reliable evaluation of microwave transistor performance
(Institute of Electrical and Electronics Engineers Inc., 2016)In this paper, we introduce the use of the low-frequency characterization of electron devices as an accurate and economical way to fast gather consistent data about the electron device performance at microwaves in the ... -
Low-temperature hollow cathode plasma-assisted atomic layer deposition of crystalline III-nitride thin films and nanostructures
(Wiley - V C H Verlag GmbH & Co. KGaA, 2015)Hollow cathode plasma-assisted atomic layer deposition (HCPA-ALD) is a promising technique for obtaining III-nitride thin films with low impurity concentrations at low temperatures. Here we report our previous and current ... -
Magnetotransport study on AlInN/(GaN)/AlN/GaN heterostructures
(Wiley, 2012-02-27)We report the effect of a thin GaN (2?nm) interlayer on the magnetotransport properties of AlInN/AlN/GaN-based heterostructures. Two samples were prepared (Sample A: AlInN/AlN/GaN and sample B: AlInN/GaN/AlN/GaN). Van der ... -
Near-UV InGaN/GaN-based dual-operation quantum optoelectronic devices
(2007)We present a novel dual-operation InGaN/GaN based quantum optoelectronic device (QOD) that operates as a quantum electroabsorption modulator in reverse bias and as a light emitter in forward bias in the spectral range of ...
