Now showing items 1-2 of 2

    • Charge Trapping Memory with 2.85-nm Si-Nanoparticles Embedded in HfO2 

      El-Atab, N.; Turgut, Berk Berkan; Okyay, Ali K.; Nayfeh, A. (Electrochemical Society Inc., 2015)
      In this work, the effect of embedding 2.85-nm Si-nanoparticles charge trapping layer in between double layers of high-κ Al<inf>2</inf>O<inf>3</inf>/HfO<inf>2</inf> oxides is studied. Using high frequency (1 MHz) ...
    • Graphene Nanoplatelets Embedded in HfO2 for MOS Memory 

      El-Atab, N.; Turgut, Berk Berkan; Okyay, Ali Kemal; Nayfeh, A. (Electrochemical Society Inc., 2015)
      In this work, a MOS memory with graphene nanoplatelets charge trapping layer and a double layer high-κ Al<inf>2</inf>O<inf>3</inf>/HfO<inf>2</inf> tunnel oxide is demonstrated. Using C-V<inf>gate</inf> measurements, the ...