Birer, O.Sayan, S.Süzer, ŞefikAydınlı, Atilla2015-07-282015-07-281999-05-040022-2860http://hdl.handle.net/11693/11100Angle-resolved XPS is used to determine the thickness and the uniformity of the chemical composition with respect to oxygen and nitrogen of the very thin silicon oxide and oxynitride overlayers grown on silicon. (C) 1999 Elsevier Science B.V. All rights reserved.EnglishAngle-resolved XpsThickness DeterminationSiliconoxynitridesXPS investigation of thin SiOx and SiOxNy overlayersArticle10.1016/S0022-2860(98)00943-0