Minne, S. C.Adams, J. D.Yaralioglu, G.Manalis, S. R.Atalar, AbdullahQuate, C. F.2015-07-282015-07-281998-09-210003-6951http://hdl.handle.net/11693/10929We present a 4 mm2 image taken with a parallel array of 10 cantilevers, an image spanning 6.4 mm taken with 32 cantilevers, and lithography over a 100 mm2 area using an array of 50 cantilevers. All of these results represent scan areas that are orders of magnitude larger than that of a typical atomic force microscope (0.01 mm2). Previously, the serial nature and limited scan size of the atomic force microscope prevented large scale imaging. Our design addresses these issues by using a modular micromachined parallel atomic force microscope array in conjunction with large displacement scanners. High-resolution microscopy and lithography over large areas are important for many applications, but especially in microelectronics, where integrated circuit chips typically have nanometer scale features distributed over square centimeter areas.EnglishCantileversArticle10.1063/1.122263