Ozgit-Akgun, ÇaglaKayacı, FatmaDönmez, İnciÇağatay, EnginUyar, TamerBıyıklı, Necmi2016-02-082016-02-0820120272-9172http://hdl.handle.net/11693/28169Conference name: Materials Research Society Symposium (MRS) Proceedings, 2011 Materials Research Society (MRS) Fall Meeting & Exhibit,Date of Conference: November 28-December 2, 2011Al 2O 3 and AlN nanotubes were fabricated by depositing conformal thin films via atomic layer deposition (ALD) on electrospun nylon 66 (PA66) nanofiber templates. Depositions were carried out at 200°C, using trimethylaluminum (TMAl), water (H 2O), and ammonia (NH 3) as the aluminum, oxygen, and nitrogen precursors, respectively. Deposition rates of Al 2O 3 and AlN at this temperature were ∼1.05 and 0.86 Å/cycle. After the depositions, Al 2O 3- and AlN-coated nanofibers were calcinated at 500°C for 2 h in order to remove organic components. Nanotubes were characterized by using X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), and transmission electron microscopy (TEM). AlN nanotubes were polycrystalline as determined by high resolution TEM (HR-TEM) and selected area electron diffraction (SAED). TEM images of all the samples reported in this study indicated uniform wall thicknesses. © 2012 Materials Research Society.EnglishAlNElectrospunsHigh-resolution TEMNylon 66Organic componentsPolycrystallineSelected area electron diffractionTEM imagesTransmission electron microscopy temTrimethylaluminumWall thicknessAluminumAluminum nitrideAtomic layer depositionDepositionElectron diffractionNanofibersNanowiresPhotoelectronsScanning electron microscopyTransmission electron microscopyX ray photoelectron spectroscopyNanotubesConference Paper10.1557/opl.2012.38