Süzer, ŞefikSayan, S.Banaszak Holl, M. M.Garfunkel, E.Hussain, Z.Hamdan, N. M.2016-02-082016-02-0820030734-2101http://hdl.handle.net/11693/24554Charging of oxide films under x rays is an important issue that must be taken into consideration for determination of core-level binding energies as well as valence band offsets. Measurements are taken as a function of time, thickness, and annealing condition. Photoemission results show the presence of metallic Hf with the 4f7/2 binding energy of 18.16 eV, and at least one clear suboxide peak.EnglishBinding energyFermi levelOxidationPhotoemissionPolycrystalline materialsSpectroscopyHafnium dioxidePolycrystalline hafnium foilSoft x ray photoemission spectroscopyValence band offsetHafnium compoundsSoft x-ray photoemission studies of Hf oxidationArticle10.1116/1.1525816