Haider A.Cansizoglu, H.Cansizoglu, M. F.Karabacak, T.Okyay, Ali KemalBıyıklı, Necmi2016-02-082016-02-0820150734-2101http://hdl.handle.net/11693/24092In this study, the authors demonstrate a proof of concept nanostructured photodiode fabrication method via successive glancing angle deposition (GLAD) and atomic layer deposition (ALD). The fabricated metal-semiconductor nanorod (NR) arrays offer enhanced photoresponse compared to conventional planar thin-film counterparts. Silver (Ag) metallic NR arrays were deposited on Ag-film/Si templates by utilizing GLAD. Subsequently, titanium dioxide (TiO2) was deposited conformally on Ag NRs via ALD. Scanning electron microscopy studies confirmed the successful formation of vertically aligned Ag NRs deposited via GLAD and conformal deposition of TiO2 on Ag NRs via ALD. Following the growth of TiO2 on Ag NRs, aluminum metallic top contacts were formed to complete the fabrication of NR-based Schottky photodiodes. Nanostructured devices exhibited a photo response enhancement factor of 1.49 × 102 under a reverse bias of 3 V. © 2014 American Vacuum Society.EnglishDepositionFabricationNanorodsPhotodiodesScanning electron microscopySilverTitanium dioxideConformal depositionEnhancement factorFabrication methodGlancing Angle DepositionMetal semiconductorsProof of conceptSchottky photodiodesVertically alignedAtomic layer depositionArticle10.1116/1.4898203