Butun, B.Cesario J.Enoch, S.Quidant, R.Özbay, Ekmel2016-02-082016-02-0820071569-4410http://hdl.handle.net/11693/23361We grew an InGaN/GaN-based light-emitting diode (LED) wafer by metal-organic chemical vapor deposition (MOCVD), fabricated devices by optical lithography, and successfully deposited ellipsoidal Ag nano-particles by way of e-beam lithography on top. The diodes exhibited good device performance, in which we expected an enhancement of the radiated intensity by the simulations and emission measurements. The obtained results showed the feasibility of plasmon-assisted LED emission enhancement.EnglishGaNInGaNMOCVDLight-emitting diode (LED)NanoparticleSurface plasmonSilverFourier modal methodPlasmonArticle10.1016/j.photonics.2007.07.0051569-4429