Sezen, H.Süzer, Şefik2016-02-082016-02-0820110021-9606http://hdl.handle.net/11693/21750Binding energies measured by x-ray photoelectron spectroscopy (XPS) are influenced by doping, since electrons are transferred to (p-type) and from (n-type) samples when they are introduced into the spectrometer, or brought into contact with each other (p-n junction). We show that the barely measurable Si2p binding energy difference between moderately doped n- and p-Si samples can be enhanced by photoillumination, due to reduction in surface band-bending, which otherwise screens this difference. Similar effects are also measured for samples containing oxide layers, since the band-bending at the buried oxide-Si interfaces is manifest as photovoltage shifts, although XPS does not probe the interface directly. The corresponding shift for the oxide layer of the p-Si is almost twice that of without the oxide, whereas no measurable shifts are observable for the oxide of the n-Si. These results are all related to band-bending effects and are vital in design and performance of photovoltaics and other related systems.EnglishBand-bending effectsBandbendingEnergy differencesOxide layerP-n junctionP-typePeak shiftPhoto-voltagePhotoilluminationPhotovoltaicsRelated systemsSurface photovoltagesBinding energyDoping (additives)Photoelectron spectroscopyPhotonsPhotovoltaic effectsPotential energySemiconductor junctionsSiliconSpectrometersX ray photoelectron spectroscopyArticle10.1063/1.36529641089-7690