Ozgur E.Huseyinoglu E.Dana, A.2018-04-122018-04-1220171559-128Xhttp://hdl.handle.net/11693/37037On-chip high-Q microcavities possess significant potential in terms of integration of optical microresonators into functional optoelectronic devices that could be used in various applications, including biosensors, photonic-integrated circuits, or quantum optics experiments. Yet, despite the convenience of fabricating wafer-scale integrated microresonators with moderate Q values using standard microfabrication techniques, surface-tension-induced microcavities (STIMs), which have atomic-level surface roughness enabling the observation of Q values larger than 106, could only be produced using individual thermal treatment of every single microresonator within the devised area. Here, we demonstrate a facile method for large-scale fabrication of silica STIMs of various morphologies. Q values exceeding 106 are readily obtained using this technique. This study represents a significant advancement toward fabrication of wafer-scale optoelectronic circuitries.EnglishMicrocavitiesOptoelectronic devicesPhotonic devicesQuantum opticsResonatorsSilicaSurface roughnessAtomic levelsHigh-Q microcavityLarge-scale fabricationMicro resonatorsMicro-fabrication techniquesOptical microcavitiesOptical microresonatorsPhotonic integrated circuitsWSI circuitsArticle10.1364/AO.56.002489